Strain Engineering of Nanoscale Si P-Type Metal-Oxide-Semiconductor Field-Effect Transistor Devices with SiGe Alloy Integrated with Contact-Etch-Stop Layer Stressors
2012 ◽
Vol 12
(7)
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pp. 5402-5406
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1999 ◽
Vol 38
(Part 2, No. 6A/B)
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pp. L629-L631
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2010 ◽
Vol 28
(4)
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pp. 799-801
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2001 ◽
Vol 45
(2)
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pp. 281-285
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2000 ◽
Vol 39
(Part 2, No. 6B)
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pp. L579-L581
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