Gate Length Scaling Effect on High-Electron Mobility Transistors Devices Using AlGaN/GaN and AlInN/AlN/GaN Heterostructures

2014 ◽  
Vol 14 (8) ◽  
pp. 6243-6246 ◽  
Author(s):  
S. Y. Liao ◽  
C. C. Lu ◽  
T. Chang ◽  
C. F. Huang ◽  
C. H. Cheng ◽  
...  
1985 ◽  
Vol 6 (3) ◽  
pp. 142-145 ◽  
Author(s):  
U.K. Mishra ◽  
S.C. Palmateer ◽  
P.C. Chao ◽  
P.M. Smith ◽  
J.C.M. Hwang

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