Gate-Length Scaling of Ultrashort Metamorphic High-Electron Mobility Transistors With Asymmetrically Recessed Gate Contacts for Millimeter- and Submillimeter-Wave Applications
2011 ◽
Vol 58
(5)
◽
pp. 1408-1417
◽
2014 ◽
Vol 14
(8)
◽
pp. 6243-6246
◽
1992 ◽
Vol 10
(6)
◽
pp. 2949
◽
2009 ◽
Vol 41
(8)
◽
pp. 1517-1521
◽
2004 ◽
Vol 43
(4B)
◽
pp. 2255-2258
◽
2011 ◽
2018 ◽
Vol 13
(8)
◽
pp. 1123-1127
◽
2006 ◽
Vol 45
(1A)
◽
pp. 13-17
◽