Gate-Length Scaling of Ultrashort Metamorphic High-Electron Mobility Transistors With Asymmetrically Recessed Gate Contacts for Millimeter- and Submillimeter-Wave Applications

2011 ◽  
Vol 58 (5) ◽  
pp. 1408-1417 ◽  
Author(s):  
Dong Xu ◽  
Xiaoping Yang ◽  
W M T Kong ◽  
P Seekell ◽  
K Louie ◽  
...  
2004 ◽  
Vol 43 (4B) ◽  
pp. 2255-2258 ◽  
Author(s):  
Akira Endoh ◽  
Yoshimi Yamashita ◽  
Keiji Ikeda ◽  
Masataka Higashiwaki ◽  
Kohki Hikosaka ◽  
...  

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