Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films
Keyword(s):
2012 ◽
Vol 3
(3)
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pp. 158-160
2016 ◽
Vol 16
(5)
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pp. 5394-5397
Keyword(s):
2012 ◽
Vol 22
(4)
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pp. 190-193
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