Low resistivity indium–tin oxide transparent conductive films. I. Effect of introducing H2O gas or H2 gas during direct current magnetron sputtering
1990 ◽
Vol 8
(3)
◽
pp. 1399-1402
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1990 ◽
Vol 8
(3)
◽
pp. 1403-1406
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Keyword(s):
2015 ◽
Vol 3
(43)
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pp. 11464-11470
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2016 ◽
Vol 8
(3)
◽
pp. 622-626
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Keyword(s):
2018 ◽
Vol 209
◽
pp. 38-45
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Keyword(s):