404 The high-speed and large-area synthesis of diamond using in-liquid plasma chemical vapor deposition

2009 ◽  
Vol 2009.47 (0) ◽  
pp. 101-102
Author(s):  
Yohei Ishimaru ◽  
Shinfuku Nomura ◽  
Hiromichi Toyota ◽  
Yoshiyuki Takahashi ◽  
Shinobu Mukasa
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Speed ◽  
Chemical Vapor ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Roll-to-Roll Graphene Synthesis by Using Microwave Plasma Chemical Vapor Deposition at Low Temperature

2012 ◽  
Vol 1401 ◽  
Author(s):  
Takatoshi Yamada ◽  
Masatou Ishihara ◽  
Jaeho Kim ◽  
Masataka Hasegawa ◽  
Sumio Iijima
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Graphene Film ◽  
Chemical Vapor ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Graphene Synthesis ◽  
Film Substrate

ABSTRACTWe reported continuous depositions of grahene films on copper foils with A4 width using roll-to-toll microwave plasma chemical vapor deposition (MWPCVD) technique. A pair of winder and unwinder was built into an MWPCVD apparatus. Surface-wave plasma enabled us to deposit large-area graphene film (substrate stage is of 480 mm x 300 mm) at temperatures below 400 ºC. In Raman spectra, G- and G’-band attributed to graphene were obtained. In addition, Dand D’-band originated from defects and/or edges were detected. These results suggested that the obtained graphene films consisted of flake boundaries and defects. After the transferring graphene onto the polyethylene terephthalate film, uniform transmittance and sheet resistance were confirmed.

NANOCRYSTALLINE DIAMOND FILMS ON HIGH SPEED STEEL BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

2005 ◽  
Vol 04 (02) ◽  
pp. 213-227
Author(s):  
VITTAYA AMORNKITBAMRUNG ◽  
THANUSIT BURINPRAKHON ◽  
WIRAT JARERNBOON
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Speed ◽  
Microwave Plasma ◽  
Diamond Films ◽  
High Speed Steel ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Nanocrystalline diamond films were deposited on high speed steel substrates by microwave plasma chemical vapor deposition. The best hardness improvement was about 130% of the substrate hardness, using -150 V substrate bias deposition conditions. Raman peaks of nanocrystalline diamond at 1190 cm-1 and of graphite nanoclusters at 1522 cm-1 wereobserved in this sample. Scanning electron microscope images show crystallite grains of different sizes between 25–250 nm.

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