J164022 Fabrication of Cu-Zr-Ti thick film structure of metallic glass

2012 ◽  
Vol 2012 (0) ◽  
pp. _J164022-1-_J164022-4
Author(s):  
Sigetaka Watanabe ◽  
Junpei Sakurai ◽  
Seiichi Hata
2015 ◽  
Vol 9 (6) ◽  
pp. 646-654 ◽  
Author(s):  
Shigetaka Watanabe ◽  
◽  
Junpei Sakurai ◽  
Mizue Mizoshiri ◽  
Seiichi Hata

In technologies involving micro electromechanical systems, lift-off processes combined with sputter deposition are general patterning methods for the formation of amorphous alloy thick film structures. However, the thicknesses of structures fabricated in this manner are not uniform because sputtered particles are blocked by the sidewalls of the lift-off layer. In this paper, a reverse lift-off process is proposed as a new patterning method for fabricating amorphous alloy thick film structures of uniform thickness. In the reverse lift-off process, a template of the desired structure is formed on top of the chosen substrate. The thick film structure is then formed by sputter deposition on the top surface of the template. In contrast to a conventional lift-off process, here the thickness of the structure is uniform because there is nothing to hinder the sputtered particles. To demonstrate this process, we successfully fabricated a Cu-Zr-Ti metallic glass thick film structure with a uniform film thickness and a rectangular cross section across different target structure widths and thicknesses. This demonstrates that the reverse lift-off process is more suitable than conventional lift-off processes for the fabrication of metallic glass thick film structures.


2015 ◽  
Vol 2015 (CICMT) ◽  
pp. 000079-000084
Author(s):  
L. Rebenklau ◽  
P. Gierth ◽  
H. Grießmann

The thick-film technology is one of the fundamental technologies for the production of circuit carriers for electronic modules. It is mainly used in areas with harsh environmental conditions, such as sensor or automotive applications. Basis of the thick film technology are glass-based pastes, which are screen printed on ceramic substrates and fired in a high temperature process at (500…1000) ° C. Such thick film pastes are commercially available from various suppliers as elements of paste systems, which mainly include compatible isolation, resistance and conductive pastes. There are a number of requirements according the fired thick film characteristics, such as high breakdown voltage of isolation thick films or low noise performances of resistance thick films. However, the most requirements are concentrating on conductor thick films. They should guarantee excellent properties in terms of assembling (soldering, bonding) which are focused in a many publications. Simultaneously, they should also offer very good electrical characteristics that have not been completely investigated until today. At Fraunhofer IKTS different measurement methods are developed and adapted to characterize the electrical performance of thick film structures. Already well known is the short term overload (STOL) measurement of thick film resistances, which determining the maximum power dissipation of the thick film structure. The basic concept of this measurement is adapted on conductive thick film structures like conductive tracks or vias. The investigations show correlations between geometrical thick film properties and the resulting thermal characteristics of the thick film structure. Results can be used to improve screen-printing layouts in terms of cost reduction (paste consumption) and thermal management (track width, via diameter), but can also help to improve paste compositions itself. The paper will give an overview of the used electrical measurement methods and present exemplary results.


2015 ◽  
Vol 135 ◽  
pp. 45-51 ◽  
Author(s):  
Shigetaka Watanabe ◽  
Junpei Sakurai ◽  
Seiichi Hata

Author(s):  
Shigetaka Watanabe ◽  
Yutaka Nakamitsu ◽  
Sakurai Junpei ◽  
Mizue Mizojiri ◽  
Seiichi Hata
Keyword(s):  

1985 ◽  
Vol 12 (1) ◽  
pp. 71-89 ◽  
Author(s):  
Stanisław Paszczyński

The problems in forming a useful model of a thick film component have been analysed. The need for such a model has been shown. Common features of thick film structures have been defined and, using the example of resistive film models that have been presented by previous authors, the trends in thick film structure modelling have been shown. Limitations of previous models have been described and, using the example of thick film resistors, the components of structure which should be taken into consideration in a complete model have been compiled. The problems in dealing with model verification, especially with regard to the choice of the criteria of quality and also in the choice of the measuring methods for obtaining component characteristics together with the values of the structural parameters, have been presented. Possible stages in the formation process of such a model and also research directions which could improve the process have been suggested.


2008 ◽  
Vol 47 (6) ◽  
pp. 4788-4791
Author(s):  
Kuang-Chung Chen ◽  
Chia-Fu Chen ◽  
Wha-Tzong Whang ◽  
Shu-Hsing Lee ◽  
Kuo-Feng Chen ◽  
...  

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