scholarly journals Thermal stability of Mg/Co multilayer with B_4C, Mo or Zr diffusion barrier layers

2011 ◽  
Vol 19 (22) ◽  
pp. 21849 ◽  
Author(s):  
Jingtao Zhu ◽  
Sika Zhou ◽  
Haochuan Li ◽  
Zhanshan Wang ◽  
Philippe Jonnard ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Barrier Layers ◽  
Thermal Stability Of

High thermal stability of magnetic tunnel junctions with oxide diffusion barrier layers

2004 ◽  
Vol 84 (2) ◽  
pp. 233-235 ◽  
Author(s):  
Yoshiyuki Fukumoto ◽  
Ken-ichi Shimura ◽  
Atsushi Kamijo ◽  
Shuichi Tahara ◽  
Hiroaki Yoda
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Tunnel Junctions ◽  
Magnetic Tunnel Junctions ◽  
High Thermal Stability ◽  
Barrier Layers ◽  
Thermal Stability Of

Effect of plasma immersion ion implantation on the thermal stability of diffusion barrier layers

2004 ◽  
Vol 186 (1-2) ◽  
pp. 77-81 ◽  
Author(s):  
Mukesh Kumar ◽  
Rajkumar ◽  
P.M Raole ◽  
S.K Gupta ◽  
Dinesh Kumar ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Ion Implantation ◽  
Diffusion Barrier ◽  
Barrier Layers ◽  
Plasma Immersion Ion Implantation ◽  
Thermal Stability Of

Thermal stability of PECVD W-B-N thin film as a diffusion barrier

1997 ◽  
Author(s):  
YongTae Kim ◽  
Dong J. Kim ◽  
Chang W. Lee ◽  
Jong-Wan Park
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Diffusion Barrier ◽  
Thermal Stability Of

Thermal stability of ultra thin Zr-B-N films as diffusion barrier between Cu and Si

2020 ◽  
Vol 527 ◽  
pp. 146810
Author(s):  
Y. Meng ◽  
Z.X. Song ◽  
Y.H. Li ◽  
D. Qian ◽  
W. Hu ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Thermal Stability Of

Thermal Stability of Amorphous-like WNx/W Bilayered Diffusion Barrier for Chemical Vapor Deposited-Tungsten/p+-Si Contact System

1999 ◽  
Vol 38 (Part 1, No. 3A) ◽  
pp. 1343-1351 ◽  
Author(s):  
Kow-Ming Chang ◽  
I-Chung Deng ◽  
Ta-Hsun Yeh ◽  
Kuen-Der Lain ◽  
Chao-Ming Fu
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Chemical Vapor ◽  
Contact System ◽  
Chemical Vapor Deposited ◽  
Thermal Stability Of

Thermal stability of AlCrTaTiZrMo-nitride high entropy film as a diffusion barrier for Cu metallization

2019 ◽  
Vol 773 ◽  
pp. 482-489 ◽  
Author(s):  
Rongbin Li ◽  
Minxu Li ◽  
Chunxia Jiang ◽  
Bangwei Qiao ◽  
Weiwei Zhang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
High Entropy ◽  
Cu Metallization ◽  
Thermal Stability Of
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