PMMA and PMMA-Ag thin films deposited by a system combining inductively coupled plasma polymerisation and RF sputtering

2017 ◽  
Vol 14 (12) ◽  
pp. 1020
Author(s):  
S.T.C. Hsieh ◽  
J.H. Hsieh ◽  
Y. Li
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Rf Sputtering ◽  
Inductively Coupled ◽  
Plasma Polymerisation

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Vacuum ◽  
2004 ◽  
Vol 74 (3-4) ◽  
pp. 485-489 ◽  
Author(s):  
Gwan-Ha Kim ◽  
Kyoung-Tae Kim ◽  
Dong-Pyo Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled ◽  
Etching Mechanism

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

2013 ◽  
Vol 113 (20) ◽  
pp. 203505 ◽  
Author(s):  
Y. N. Guo ◽  
D. Y. Wei ◽  
S. Q. Xiao ◽  
S. Y. Huang ◽  
H. P. Zhou ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Microcrystalline Silicon ◽  
Inductively Coupled ◽  
Silicon Thin Films

Etching mechanisms of (Ba,Sr)TiO3 thin films in CF4/Ar inductively coupled plasma

2004 ◽  
Vol 71 (1) ◽  
pp. 54-62 ◽  
Author(s):  
A.M Efremov ◽  
Dong-Pyo Kim ◽  
Kyoung-Tae Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled

(Pb,Sr)TiO3 thin films etching characteristics using inductively coupled plasma

2004 ◽  
Vol 447-448 ◽  
pp. 688-692 ◽  
Author(s):  
Gwan-Ha Kim ◽  
Kyoung-Tae Kim ◽  
Dong-Pyo Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled
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