Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis
Keyword(s):
On Line
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Abstract Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are separate. The analysis of self-traceable Cr atom lithography nano-gratings shows a positive relevance and sensitivity between LER and evaluated standard deviation of pitch. Therefore, LER can be used as an aided pre-evaluation parameter for the pitch calculation method, such as the gravity center method or the zero-crossing points method. The optimization of the nano-grating evaluation method helps to obtain the accurate pitch value with fewer measurements and provide a comprehensive characterization of pitch standards.
Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method
2002 ◽
Vol 20
(4)
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pp. 1342
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Keyword(s):
On Line
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Keyword(s):
2008 ◽
Vol 47
(4)
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pp. 2501-2505
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