Characterization of line edge roughness and line width roughness of nano-scale typical structures

Author(s):  
Zhuangde Jiang ◽  
Fengxia Zhao ◽  
Weixuan Jing ◽  
Philip D. Prewett ◽  
Kyle Jiang
2010 ◽  
Vol 437 ◽  
pp. 45-50
Author(s):  
Zhuang De Jiang ◽  
Feng Xia Zhao ◽  
Wei Xuan Jing ◽  
Philip D. Prewett ◽  
Kyle Jiang

Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable.


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