The Characterization of KrF Photoresists and the Effect of Different Chromophore Bulkiness on Line Edge Roughness (LER) for Submicron Technology

2006 ◽  
Author(s):  
Ahmad Yusri Mohamed Bakri ◽  
Mohd. Jeffery Manaf ◽  
Kader Ibrahim Abdul Wahab ◽  
Ibrahim Bin Ahmad
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
On Line

scholarly journals Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis

2017 ◽  
Vol 17 (6) ◽  
pp. 264-268 ◽  
Author(s):  
Jie Chen ◽  
Jie Liu ◽  
Xingrui Wang ◽  
Longfei Zhang ◽  
Xiao Deng ◽  
...  
Keyword(s):  
Evaluation Method ◽  
Line Edge Roughness ◽  
Zero Crossing ◽  
Edge Roughness ◽  
Roughness Analysis ◽  
On Line ◽  
Two Parameters ◽  
Atom Lithography ◽  
Positive Relevance

Abstract Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are separate. The analysis of self-traceable Cr atom lithography nano-gratings shows a positive relevance and sensitivity between LER and evaluated standard deviation of pitch. Therefore, LER can be used as an aided pre-evaluation parameter for the pitch calculation method, such as the gravity center method or the zero-crossing points method. The optimization of the nano-grating evaluation method helps to obtain the accurate pitch value with fewer measurements and provide a comprehensive characterization of pitch standards.

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness

Characterization of Line-edge Roughness in Cu/low-k Interconnect Pattern

2007 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken’ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Low K

The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks

2007 ◽  
Author(s):  
Frank Scholze ◽  
Christian Laubis ◽  
Uwe Dersch ◽  
Jan Pomplun ◽  
Sven Burger ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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