Reconstructed Au (100) Surface Imaged with Scanning Tunneling Microscopy in Air

1992 ◽  
Vol 47 (12) ◽  
pp. 1187-1190 ◽  
Author(s):  
T. Schilling ◽  
B. Tesche ◽  
G. Lehmpfuhl
Keyword(s):  
Electron Microscopy ◽  
Scanning Tunneling Microscopy ◽  
Interatomic Distance ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Atomic Steps ◽  
Reflection Electron Microscopy ◽  
Good Agreement

Abstract Scanning tunneling microscopy (STM) of Au(100) was performed in air with a NanoScope II. Regions of 150 x 150 nm with atomatically flat areas fragmented by atomic steps were observed. The reconstructed (100) surface, deformed to a twisted hexagon with an interatomic distance of 0.27 μ ± 0.02 nm, could be seen and a corrugation of about 0.05 nm depth was measured. These results are in good agreement with Reflection Electron Microscopy measurements and STM investigations in UHV.

Morphology and distribution of atomic steps on Si (001) studied with scanning tunneling microscopy

1990 ◽  
Vol 56 (1) ◽  
pp. 39-41 ◽  
Author(s):  
D. Dijkkamp ◽  
A. J. Hoeven ◽  
E. J. van Loenen ◽  
J. M. Lenssinck ◽  
J. Dieleman
Keyword(s):  
Scanning Tunneling Microscopy ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Atomic Steps

Stress-induced structures on surfaces observed using Scanning Tunneling Microscopy and low-energy Electron Microscopy

1992 ◽  
Vol 50 (1) ◽  
pp. 332-333
Author(s):  
Ellen D. Williams ◽  
R.J. Phaneuf ◽  
N.C. Bartelt ◽  
W. Swiech ◽  
E. Bauer
Keyword(s):  
Electron Microscopy ◽  
Surface Morphology ◽  
Scanning Tunneling Microscopy ◽  
High Vacuum ◽  
Finite Size ◽  
Low Energy ◽  
Energy Electron ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Low Energy Electron

Elastic stresses play a well-known and important role in the structure of thin films during growth. However, elastic effects can also greatly influence surface morphology of the substrate. One source of this influence, as has long been recognized is the elastic interactions between steps on surfaces. More recently, Marchenko has shown that surface stress can stabilize finite-size structures in surfaces, such as facets. Traditionally surface morphologies such as steps and facets have been measured by low-energy electron diffraction. However, the more recent development of ultra-high vacuum compatible microscopic techniques such as scanning tunneling microscopy, reflection electron microscopy, and low-energy electron microscopy, now make it possible to image steps and facets directly to obtain information about sizes and size distributions. This information in turn makes it possible to test the influence of stress on surface morphology directly.

The use of Scanning Tunneling Microscopy in combination with Scanning Electron Microscopy in the fabrication and imaging of microstructures

1990 ◽  
Vol 48 (4) ◽  
pp. 752-753
Author(s):  
J.M. Gómez-Rodríguez ◽  
Baró A.M.
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Electron Microscope ◽  
Scanning Tunneling Microscopy ◽  
Scanning Tunneling ◽  
Simultaneous Operation ◽  
Tunneling Microscopy ◽  
Versatile Technique ◽  
Scanning Range ◽  
Scanning Electron

In the last few years, Scanning Tunneling Microscopy (STM), has proven to be a powerful and versatile technique to investigate the topographic and electronic structure of metals and semiconductors with an unprecedent vertical (0.01 nm) and lateral (0.2 nm) resolution. In this paper we are interested in the use of STM to study surfaces having microfabricated structures in the nanometer range, particularly those produced by the STM tip itself.In order to study these samples we have used an STM integrated into a commercial Scanning Electron Microscope (SEM). This allows to address two problems which limit the operation of STM: (i) the limited STM scanning range (1-10 μm) which makes difficult the localization of microstructures on the sample; (ii) the undetermined size and shape of the STM probing tip.Our STM/SEM combination has been described in detail earlier. In short, it consists of an STM placed on the sample stage of a commercial SEM allowing the simultaneous operation of both microscopes.

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