Autostoichiometric vapor deposition: Part I. Theory

The possibility of an autostoichiometric vapor deposition is explored. Heterometal-organic complexes such as double alkoxides are potential candidate precursors for such deposition. Two reaction schemes, the hydrolysis-assisted pyrolysis and the hydrolysis-polycondensation of double alkoxides, are identified to be autostoichiometric reactions. A simple low-pressure apparatus is suggested for autostoichiometric vapor deposition. Mass-flow analysis allows for the identification of a nonstoichiometry factor K which can be used as a quantitative measure of the precursor's autostoichiometric capability.