Influence of Processing Conditions on Mechanical and Structural Properties of DLC Produced by FIB-CVD Method

ABSTRACTInfluence of processing condition on mechanical and structural properties of diamond-like carbon (DLC) by focused ion-beam chemical vapor deposition (FIB-CVD) method was investigated. The DLC specimens were produced under conditions of varying supplied amount of material gas and probe current of FIB. Volume determination results of DLC structures indicated that a deposition rate was increased with both the amount of gas and the probe current. To evaluation of mechanical property, indentation hardness was measured by a nano-indentation tester. From evaluation of mechanical property, it was found that the indentation hardness was sensitive to the processing condition, showing in the range of 8-13 GPa. The hardness of DLC structures was seemed to be lower when etching process higher contributed for formation process. Crystallographic structure of DLC remained amorphous even though the mechanical properties varied widely. Results of hydrogen concentration measurement indicated that increase of hydrogen concentration might lead to decrease of hardness.

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Mechanical and Structural Properties of Fluorine-Ion-Implanted Boron Suboxide

Advances in Materials Science and Engineering ◽

10.1155/2012/792973 ◽

2012 ◽

Vol 2012 ◽

pp. 1-11

Author(s):

Ronald Machaka ◽

Bonex W. Mwakikunga ◽

Elayaperumal Manikandan ◽

Trevor E. Derry ◽

Iakovos Sigalas ◽

...

Keyword(s):

Ion Implantation ◽

Structural Properties ◽

Ion Beam ◽

High Dose ◽

Near Surface ◽

Force Microscopy ◽

Atomic Force ◽

Boron Suboxide ◽

Mechanical And Structural Properties ◽

Fluorine Ions

Results on a systematic study on the effects of ion implantation on the near-surface mechanical and structural properties of boron suboxide (B6O) prepared by uniaxial hot pressing are reviewed. 150 keV fluorine ions at fluences of up to5.0×1016 ions/cm2were implanted into the ultrahard ceramic material at room temperature and characterized using Raman spectroscopy, atomic force microscopy, and scanning electron microscopy with energy-dispersive X-ray spectroscopy. Evidence of ion-beam-assisted nucleation of novel clusteredBxOyFzparticles by ion implantation is revealed. In addition, obtained results also reveal that fluorine implantation into the B6O specimen leads to an overall degradation of near-surface mechanical properties with increasing fluorine fluence. Implications of these observations in the creation of amorphous near-surface layers by high-dose ion implantation are discussed in this paper.

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Mechanical and structural properties of Permalloy films on glass and/or Si(111) substrates

Applied Physics A ◽

10.1007/s00339-008-4841-3 ◽

2008 ◽

Vol 94 (2) ◽

pp. 431-436 ◽

Cited By ~ 7

Author(s):

S. U. Jen ◽

Y. T. Chen ◽

N. T. Yang ◽

W. C. Cheng

Keyword(s):

Structural Properties ◽

Mechanical And Structural Properties

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The Use of Ion Milling for Surface Preparation for EBSD Analysis

Materials ◽

10.3390/ma14143970 ◽

2021 ◽

Vol 14 (14) ◽

pp. 3970

Author(s):

Wojciech J. Nowak

Keyword(s):

Plasma Etching ◽

Ion Beam ◽

Metallic Matrix ◽

Surface Preparation ◽

Optical Emission ◽

Alternative Methods ◽

Ebsd Analysis ◽

Crystallographic Structure ◽

Ion Milling ◽

Electron Backscattered Diffraction

An electron backscattered diffraction (EBSD) method provides information about the crystallographic structure of materials. However, a surface subjected to analysis needs to be well-prepared. This usually requires following a time-consuming procedure of mechanical polishing. The alternative methods of surface preparation for EBSD are performed via electropolishing or focus ion beam (FIB). In the present study, plasma etching using a glow discharge optical emission spectrometer (GD-OES) was applied for surface preparation for EBSD analysis. The obtained results revealed that plasma etching through GD-OES can be successfully used for surface preparation for EBSD analysis. However, it was also found that the plasma etching is sensitive for the alloy microstructure, i.e., the presence of intermetallic phases and precipitates such as carbides possess a different sputtering rate, resulting in non-uniform plasma etching. Preparation of the cross-section of oxidized CM247 revealed a similar problem with non-uniformity of plasma etching. The carbides and oxide scale possess a lower sputtering rate than the metallic matrix, which caused formation of relief. Based on obtained results, possible resolutions to suppress the effect of different sputtering rates are proposed.

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