Flexible a-Si:H-based Image Sensors Fabricated by Digital Lithography
AbstractAmorphous silicon-based x-ray image sensor arrays were fabricated on poly-ethylene naphthalate substrates at process temperatures below 180°C. Patterning of the thin-film transistor backplane was accomplished using ink-jet printed etch masks. The sensor devices were found to be comparable to high-temperature processed devices. The integration of the sensor stack, TFT array and PEN substrate resulted in a flexible x-ray image sensor with 180×180 pixels with 75 dpi resolution.
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2009 ◽
Vol 89
(28-30)
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pp. 2687-2697
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1968 ◽
Vol 15
(4)
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pp. 215-219
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2011 ◽
Vol 50
(2R)
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pp. 024103
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