Growth and Characterization of Lpe GaAs on GaAs-Coated Si Prepared By Mbe
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AbstractGaAs has been successfully grown by LPE on partly covered (windowed) GaAs-on-Si substrates prepared by MBE. Almost dislocation-free layers were obtained in narrow stripe windows. The grown layers were characterized by photoluminescence and Hall effect measurement. The photoluminescence polarization indicated that a uniaxial tensile stress along the stripe direction is applied in the mesa stripe LPE layer while it is biaxial in the wide GaAs layer on Si. The stress relaxation in the direction perpendicular to the stripe is discussed.
2012 ◽
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1995 ◽
Vol 31
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pp. 2510-2521
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1980 ◽
Vol 26
(94)
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pp. 275-282
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2020 ◽
Vol 782
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pp. 139274
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2016 ◽
Vol 20
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pp. 04015075
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1995 ◽
Vol 117
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pp. 346-356
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