Raman Scattering with Nanosecond Resolution During Pulsed Laser Heating of Silicon

1982 ◽  
Vol 13 ◽  
Author(s):  
D. Von Der Linde ◽  
G. Wartmann ◽  
A. Ozols
Keyword(s):  
Phase Transition ◽  
Raman Scattering ◽  
Laser Heating ◽  
Crystalline Silicon ◽  
Silicon Crystal ◽  
Pulsed Laser ◽  
Lattice Temperature ◽  
Time Resolved ◽  
Pulsed Laser Heating ◽  
Anti Stokes

ABSTRACTWe present time-resolved measurements of spontaneous anti-Stokes and Stokes Raman scattering during pulsed laser heating of crystalline silicon. The time-evolution of the lattice temperature is determined from the measured anti-Stokes/Stokes intensity ratio. In a separate calibration experiment we measure the temperature dependence of the anti-Stokes/Stokes ratio of an oven-heated silicon crystal from 300 K up to 900 K. The phase transition occuring during laser heating is detected by monitoring the changes of the optical reflectivity during laser irradiation. Our data suggest that the phase transition occurs at a lattice temperature of ∼600 K.

Time Resolved Spectra of Raman and Thermal Emission During Pulsed Laser Heating of Silicon

1983 ◽  
Vol 23 ◽  
Author(s):  
D. Von Der Linde ◽  
G. Wartmann ◽  
M. Kemmler ◽  
Zhen-He Zhu
Keyword(s):  
Laser Heating ◽  
Thermal Emission ◽  
Crystalline Silicon ◽  
Laser Pulses ◽  
Low Frequencies ◽  
Time Resolved ◽  
Emission Time ◽  
Pulsed Laser Heating ◽  
Anti Stokes ◽  
532 Nm

ABSTRACTLaser heating of crystalline silicon is investigated with 10 ns laser pulses at 532 nm Raman spectra below the transition threshold show distinct shifts to low frequencies. The absence of line shifts at higher energy is due to a time resolution artifact. Temperatures evaluated from frequency resolved anti-Stokes/Stokes ratios are in agreement with the temperature estimated from line shifts, and provide clear evidence that the surface reaches the melting point. These conclusions are confirmed by independent measurements of the thermal emission. Time-resolved pyrometry also provides the temperature evolution of the liquid phase.

TIME RESOLVED RAMAN SPECTRA DURING PULSED LASER HEATING OF SILICON

1983 ◽  
Vol 44 (C5) ◽  
pp. C5-107-C5-110
Author(s):  
G. Wartmann ◽  
D. von der Linde
Keyword(s):  
Raman Spectra ◽  
Laser Heating ◽  
Pulsed Laser ◽  
Time Resolved ◽  
Pulsed Laser Heating

scholarly journals Time-resolved, local temperature measurements during pulsed laser heating

2010 ◽  
Vol 12 (8) ◽  
pp. 083011 ◽  
Author(s):  
Ralf S Kappes ◽  
Chen Li ◽  
Hans-Jürgen Butt ◽  
Jochen S Gutmann
Keyword(s):  
Laser Heating ◽  
Pulsed Laser ◽  
Temperature Measurements ◽  
Local Temperature ◽  
Time Resolved ◽  
Pulsed Laser Heating

scholarly journals Portable double-sided pulsed laser heating system for time-resolved geoscience and materials science applications

2017 ◽  
Vol 88 (8) ◽  
pp. 084501 ◽  
Author(s):  
G. Aprilis ◽  
C. Strohm ◽  
I. Kupenko ◽  
S. Linhardt ◽  
A. Laskin ◽  
...  
Keyword(s):  
Laser Heating ◽  
Materials Science ◽  
Pulsed Laser ◽  
Heating System ◽  
Time Resolved ◽  
Pulsed Laser Heating

Pulsed laser heating of soot: morphological changes

Carbon ◽  
1999 ◽  
Vol 37 (2) ◽  
pp. 231-239 ◽  
Author(s):  
Randy L Vander Wal ◽  
Mun Y Choi
Keyword(s):  
Laser Heating ◽  
Morphological Changes ◽  
Pulsed Laser ◽  
Pulsed Laser Heating

Thermal Modeling of the Cavity in Pulsed Excimer Laser Calorimeters

2000 ◽  
Author(s):  
D. H. Chen ◽  
Z. M. Zhang
Keyword(s):  
Laser Heating ◽  
Average Power ◽  
Pulsed Laser ◽  
Thermal Response ◽  
Element Model ◽  
Electrical Heating ◽  
Deep Ultraviolet ◽  
Simplified Finite Element Model ◽  
193 Nm ◽  
Pulsed Laser Heating

Abstract A simplified finite element model is built to study the thermal response of the 193-nm pulsed-laser calorimeter. The nonequivalence between pulsed-laser heating and electrical heating is estimated to be 0.46% at the thermocouple locations by comparing the calibration factors for average-power laser heating and electrical heating. This study should help the development of calibration and measurement standards in pulsed energy measurements for deep ultraviolet excimer lasers that are important for photolithographic and materials processing applications.

Effect of pulsed laser heating on the magnetic properties of the amorphous alloy Fe76Si13B11

2009 ◽  
Vol 108 (2) ◽  
pp. 125-130 ◽  
Author(s):  
V. V. Girzhon ◽  
A. V. Smolyakov ◽  
N. G. Babich ◽  
M. P. Semen’ko
Keyword(s):  
Magnetic Properties ◽  
Amorphous Alloy ◽  
Laser Heating ◽  
Pulsed Laser ◽  
Pulsed Laser Heating
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