Multilayer Monochromators for the Soft X-Ray and Extreme Ultraviolet

1988 ◽  
Vol 143 ◽  
Author(s):  
Troy W. Barbee ◽  
Piero Pianetta

Simple multilayer structures and multilayer diffraction gratings are now of sufficient quality to be used as optical elements in synchrotron radiation source instrumentation. In this paper results obtained with a multilayer two element monochromator will be presented. Three specific types of results will be discussed. First, transmission measurements of the absorption cross-sections of elemental thin films in the energy range 50 to 2000 eV will be presented and used to demonstrate the performance of the monochromator. Second, application of this monochromator in x-ray lithography research will be described and the advantages of the broad bandpass of multilayer optics demonstrated. Third, use of this monochromator in scattering studies of long period structures will be discussed. The potential for the use of multilayer diffraction gratings in high resolution monochromator applications will also be considered.

1987 ◽  
Vol 103 ◽  
Author(s):  
Troy W. Barbee

ABSTRACTMultilayers are man-made microstructures engineered to vary in depth that are now of sufficient quality to be used as x-ray, soft x-ray and extreme ultraviolet optics. Gratings are in-plane man-made microstructures which have been used as optic elements for most of this century. Joining of these two optical elements to form combined microstructure optics has the potential for greatly enhancing both the resolution and the throughput attainable in these spectral ranges. Experimental results for multilayer gratings are presented and discussed. It will be demonstrated that multilayer diffraction gratings act as x-ray prisms and are high efficiency dispersion elements.


1987 ◽  
Vol 103 ◽  
Author(s):  
R. M. Bionta ◽  
A. F. Jankowski ◽  
D. M. Makowiecki

ABSTRACTWe have made and tested several sliced multilayer structures which can function as transmissive x-ray optical elements (diffraction gratings, zone plates, and phase gratings) at 8 keV. Our automated multilayer sputtering system is optimized to sputter layers of arbitrary thickness for very large total deposits at high deposition rates. Diffraction patterns produced by the multilayer devices closely match theoretical predictions. Such transmissive optics have the potential for wide application in high resolution microscope and spectrometer systems.


1988 ◽  
Vol 143 ◽  
Author(s):  
Troy W. Barbee

AbstractThe dispersion of x-rays (XR), soft x-rays (SXR) and extreme ultraviolet (EUV) light by multilayer structures is dependent on the scattering and absorption cross-sections of the elements used to synthesize the multilayer. In this paper it will be shown that this dependence provides a means for the accurate experimental determination of the optical constants of the multilayer constituents. Two specific approaches will be presented and discussed. First, it will be shown that detailed analysis of the energy dependence of the reflectivity of a simple depth periodic multilayer allows the unfolding of the optical constants. Secondly a new optic structure, the multilayer diffraction grating, will be described and it will be demonstrated that such combined microstructure optics allow the scattering cross-sections of the multilayer constituents to be accurately determined over broad spectral ranges.


2021 ◽  
Vol 2103 (1) ◽  
pp. 012168
Author(s):  
D V Sivkov ◽  
S V Nekipelov ◽  
O V Petrova ◽  
D V Bogachuk ◽  
R N Skandakov ◽  
...  

Abstract Using data on the absorption cross sections the refraction coefficient spectral dependence n(E) and the spectra of the remaining optical coefficients (reflection coefficient, phase shift, and atomic form factor) in the fullerite C60 C 1s near edge X-ray absorption fine structure (NEXAFS) region (280–350 eV) were determined. For the n(E) calculations the Kramers-Kronig integral relations (KKRs) were used. The KKR computations were performed using data on atomic carbon absorption cross sections in the 10–30000 eV range and on solid and gaseous C60 – in the 0–120 eV. Absorption cross section spectrum in the fullerite C60 C 1s NEXAFS region were measured.


1983 ◽  
Vol 12 (4) ◽  
pp. 153-162 ◽  
Author(s):  
J. N. Chapman ◽  
C. C. Gray ◽  
B. W. Robertson ◽  
W. A. P. Nicholson
Keyword(s):  

2011 ◽  
Vol 109 (9) ◽  
pp. 094314 ◽  
Author(s):  
Christian Uhrenfeldt ◽  
Jacques Chevallier ◽  
Arne Nylandsted Larsen ◽  
Brian Bech Nielsen

2018 ◽  
Vol 122 (29) ◽  
pp. 7375-7384 ◽  
Author(s):  
Markus Kubin ◽  
Meiyuan Guo ◽  
Maria Ekimova ◽  
Erik Källman ◽  
Jan Kern ◽  
...  

2019 ◽  
Vol 26 (1) ◽  
pp. 18-27 ◽  
Author(s):  
Mykola Biednov ◽  
Günter Brenner ◽  
Benjamin Dicke ◽  
Holger Weigelt ◽  
Barbara Keitel ◽  
...  

An extreme-ultraviolet (XUV) double-stage Raman spectrometer is permanently installed as an experimental end-station at the PG1 beamline of the soft X-ray/XUV free-electron laser in Hamburg, FLASH. The monochromator stages are designed according to the Czerny–Turner optical scheme, adapted for the XUV photon energy range, with optical elements installed at grazing-incidence angles. Such an optical scheme along with the usage of off-axis parabolic mirrors for light collimation and focusing allows for aberration-free spectral imaging on the optical axis. Combining the two monochromators in additive dispersion mode allows for reaching high resolution and superior stray light rejection, but puts high demands on the quality of the optical alignment. In order to align the instrument with the highest precision and to quantitatively characterize the instrument performance and thus the quality of the alignment, optical laser interferometry, Hartmann–Shack wavefront-sensing measurements as well as off-line soft X-ray measurements and extensive optical simulations were conducted. In this paper the concept of the alignment scheme and the procedure of the internal optical alignment are presented. Furthermore, results on the imaging quality and resolution of the first monochromator stage are shown.


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