scholarly journals Fabrication and Evaluation of Transmissive Multilayer Optics for 8keVX Rays

1987 ◽  
Vol 103 ◽  
Author(s):  
R. M. Bionta ◽  
A. F. Jankowski ◽  
D. M. Makowiecki
Keyword(s):  
High Resolution ◽  
Diffraction Gratings ◽  
Multilayer Structures ◽  
Optical Elements ◽  
Deposition Rates ◽  
X Ray ◽  
Arbitrary Thickness ◽  
Theoretical Predictions ◽  
Diffraction Patterns ◽  
Sputtering System

ABSTRACTWe have made and tested several sliced multilayer structures which can function as transmissive x-ray optical elements (diffraction gratings, zone plates, and phase gratings) at 8 keV. Our automated multilayer sputtering system is optimized to sputter layers of arbitrary thickness for very large total deposits at high deposition rates. Diffraction patterns produced by the multilayer devices closely match theoretical predictions. Such transmissive optics have the potential for wide application in high resolution microscope and spectrometer systems.

Multilayer Monochromators for the Soft X-Ray and Extreme Ultraviolet

1988 ◽  
Vol 143 ◽  
Author(s):  
Troy W. Barbee ◽  
Piero Pianetta
Keyword(s):  
Thin Films ◽  
Cross Sections ◽  
Extreme Ultraviolet ◽  
Diffraction Gratings ◽  
Multilayer Structures ◽  
Absorption Cross ◽  
Optical Elements ◽  
X Ray ◽  
Long Period ◽  
Transmission Measurements

Simple multilayer structures and multilayer diffraction gratings are now of sufficient quality to be used as optical elements in synchrotron radiation source instrumentation. In this paper results obtained with a multilayer two element monochromator will be presented. Three specific types of results will be discussed. First, transmission measurements of the absorption cross-sections of elemental thin films in the energy range 50 to 2000 eV will be presented and used to demonstrate the performance of the monochromator. Second, application of this monochromator in x-ray lithography research will be described and the advantages of the broad bandpass of multilayer optics demonstrated. Third, use of this monochromator in scattering studies of long period structures will be discussed. The potential for the use of multilayer diffraction gratings in high resolution monochromator applications will also be considered.

scholarly journals Advances in Synchrotron X-ray Polycrystalline Diffraction

1988 ◽  
Vol 41 (2) ◽  
pp. 101 ◽  
Author(s):  
William Parrish
Keyword(s):  
High Resolution ◽  
Grazing Angle ◽  
Anomalous Scattering ◽  
Wavelength Selection ◽  
High Count ◽  
Instrument Function ◽  
X Ray ◽  
Depth Analysis ◽  
Diffraction Patterns ◽  
New Applications

The advantages of synchrotron radiation for X-ray polycrystalline diffraction are illustrated by a number of examples. The plane wave parallel-beam X-ray optics uses a Si(lll) channel monochromator for easy wavelength selection and a set of long parallel slits to define the diffracted beam. The constant simple instrument function and the high resolution symmetrical profiles (FWHM 0.05") greatly simplify the data analysis and add a new dimension to profile broadening studies. The geometry permits uncoupling the 6-26 sample-detector relationship without changing the profile shape and makes possible new applications such as grazing angle incidence depth analysis of thin films. The same instrumentation is used for high resolution energy dispersive diffraction (BOD) by step-scanning the monochromator. The resolution is two orders of magnitude better than conventional BOD and can be used at high count rates. The easy wavelength selection yields diffraction patterns with the highest PI B and permits anomalous scattering studies.

scholarly journals Microstructure and Stability Comparison of Nanometer Period W/C, Wc/C, and Ru/C Multilayer Structures

1990 ◽  
Vol 187 ◽  
Author(s):  
Tai D. Nguyen ◽  
Ronald Gronsky ◽  
Jeffrey B. Kortright
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Layered Structures ◽  
Multilayer Structures ◽  
X Ray ◽  
Transmission Electron

AbstractMultilayer structures of W/C, WC/C, and Ru/C, of various periods were prepared and studied by high-resolution transmission electron microscopy. Comparison of the phases in the layered structures is made for as-prepared and annealed samples. Both as-prepared and annealed WC/C multilayers are predominantly amorphous, while the phases in the W/C depend on the periods. The 2 nm period W/C multilayer remains amorphous after annealing, and the longer periods recrystallize to form W2C. The layered microstructures of W/C and WC/C are stable on annealing at all periods, while the amorphous Ru-rich layers in the 2 nm period Ru/C multilayer agglomerate upon annealing to form elemental hexagonal Ru crystallites. Larger period Ru/C multilayers show stable layered structures, and indicate hexagonal Ru in the Ru-rich layers. X-ray measurements show that the multilayer periods expand on annealing for all metal-carbon multilayers studied.

Atomic structure of YB56 studied by digital high-resolution electron microscopy and electron diffraction

2001 ◽  
Vol 16 (1) ◽  
pp. 101-107 ◽  
Author(s):  
Takeo Oku ◽  
Jan-Olov Bovin ◽  
Iwami Higashi ◽  
Takaho Tanaka ◽  
Yoshio Ishizawa
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Electron Diffraction ◽  
High Resolution Electron Microscopy ◽  
Charge Coupled Device ◽  
X Ray ◽  
Resolution Electron ◽  
High Resolution Images ◽  
Diffraction Patterns ◽  
Simulated Images

Atomic positions for Y atoms were determined by using high-resolution electron microscopy and electron diffraction. A slow-scan charge-coupled device camera which had high linearity and electron sensitivity was used to record high-resolution images and electron diffraction patterns digitally. Crystallographic image processing was applied for image analysis, which provided more accurate, averaged Y atom positions. In addition, atomic disordering positions in YB56 were detected from the differential images between observed and simulated images based on x-ray data, which were B24 clusters around the Y-holes. The present work indicates that the structure analysis combined with digital high-resolution electron microscopy, electron diffraction, and differential images is useful for the evaluation of atomic positions and disordering in the boron-based crystals.

High-resolution TEM and XRD simulation of stacking disorder in 2:1 phyllosilicates

2008 ◽  
Vol 223 (01-02) ◽  
Author(s):  
Toshihiro Kogure ◽  
Jun Kameda
Keyword(s):  
High Resolution ◽  
Lateral Displacement ◽  
X Ray ◽  
Transmission Electron ◽  
Significant Difference ◽  
High Resolution Tem ◽  
Interlayer Region ◽  
Diffraction Patterns ◽  
Two Alternatives ◽  
Stacking Disorder

Stacking disorder is a common phenomenon in phyllosilicates but its nature is difficult to be deduced using conventional diffraction techniques. In contrast, recent investigations using high-resolution transmission electron microscopy (HRTEM) have elucidated the structure of stacking disorder in various phyllosilicates, by directly observing individual layers and stacking sequences. Furthermore, simulations of X-ray or electron diffraction patterns using the information from the HRTEM results can complement the limited analysis area in TEM and quantify the density of the stacking disorder.Although the bonding between adjacent layers is similar, there is a significant difference in the stacking disorder between two counterparts of dioctahedral and trioctahedral 2 : 1 phyllosilicates: pyrophyllite vs. talc and sudoite vs. trioctahedral chlorite. In pyrophyllite and sudoite, stacking disorder is caused mainly by two alternatives of the lateral displacement directions between the two tetrahedral sheets across the interlayer region. On the other hand, rotation of 2 : 1 layer is also an origin of the stacking disorder in talc and trioctahedral chlorite. This difference is explained by the corrugation of basal oxygen planes on the dioctahedral 2 : 1 layer formed by the tetrahedral tilting to enlarge

scholarly journals High-speed classification of coherent X-ray diffraction patterns on the K computer for high-resolution single biomolecule imaging

2013 ◽  
Vol 20 (6) ◽  
pp. 899-904 ◽  
Author(s):  
Atsushi Tokuhisa ◽  
Junya Arai ◽  
Yasumasa Joti ◽  
Yoshiyuki Ohno ◽  
Toyohisa Kameyama ◽  
...  
Keyword(s):  
High Resolution ◽  
High Speed ◽  
X Ray Diffraction ◽  
X Ray ◽  
Diffraction Patterns ◽  
Resolution Single

The Effect of Pb on the Interface Structure of Fe/Cr(100) Metallic Multilayers

2000 ◽  
Vol 648 ◽  
Author(s):  
Kyu-Young Kim ◽  
Masao Kamiko ◽  
Sang-Mun Oh ◽  
Guang-Hong Lu ◽  
Ryoichi Yamamoto
Keyword(s):  
Magnetic Field ◽  
High Resolution ◽  
Interface Structure ◽  
Metallic Multilayers ◽  
X Ray Diffraction ◽  
X Ray ◽  
Diffraction Patterns ◽  
Interface Structures

AbstractWe investigated the differences in the interface structures and magnetotransport properties between surfactant-mediated multilayers and normal ones. From the observations of RHEED and High-Resolution X-ray diffraction patterns, we confirmed that the surfaces of Fe/Cr(100) multilayers with Pb are flatter and the interfaces are sharper than one without Pb, which means that Pb operates as an effective surfactant. The magnetoresistance(MR) ratio of the multilayers prepared with Pb was larger than that of the multilayers prepared without Pb. The change of resistance with magnetic field was larger for the multilayers with a surfactant.

High‐resolution electron microscopy study of x‐ray multilayer structures

1987 ◽  
Vol 61 (4) ◽  
pp. 1422-1428 ◽  
Author(s):  
Amanda K. Petford‐Long ◽  
Mary Beth Stearns ◽  
C.‐H. Chang ◽  
S. R. Nutt ◽  
D. G. Stearns ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Multilayer Structures ◽  
X Ray ◽  
Resolution Electron

X-Ray Microbeam Studies of Electromigration

1999 ◽  
Vol 563 ◽  
Author(s):  
G. S. Cargill III ◽  
A. C. Ho ◽  
K. J. Hwang ◽  
H. K. Kao ◽  
P.-C. Wang ◽  
...  
Keyword(s):  
High Resolution ◽  
Real Time ◽  
High Stability ◽  
Polycrystalline Metal ◽  
Optical Elements ◽  
High Brightness ◽  
X Ray ◽  
Composition Changes ◽  
Stability Energy ◽  
Made In

AbstractThe interplay between stress and electromigration has been recognized since I. A. Blech et al. used x-ray topography in 1976 to demonstrate that stress gradients developed during electromigration. Availability of high brightness synchrotron x-ray sources, high stability energy dispersive detectors, high resolution area detectors, and pinholes, capillaries and other optical elements for forming x-ray microbeams, has made possible more quantitative, real time measurements of strains and composition changes which develop in polycrystalline metal conductor lines during electromigration. This paper describes advances made in this area, implications of results which have been obtained, and prospects for further progress.

Sign in / Sign up

Export Citation Format

Share Document