Micromagnetic Processes in Steels

1991 ◽  
Vol 232 ◽  
Author(s):  
A. D. Beale ◽  
M. G. Hetherington ◽  
J. P. Jakubovics ◽  
B. A. Lewis ◽  
C. B. Scruby
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Domain Structure ◽  
Magnetic Domain ◽  
Magnetic Domain Structure ◽  
Magnetoacoustic Emission ◽  
Transmission Electron ◽  
Heat Treated

ABSTRACTMagnetoacoustic emission (MAE) and Barkhausen emission (BE) measurements have been carried out on steel specimens heat treated to produce various microstructures ranging from martensitic/bainitic to ferritic/pearlitic. The magnetic domain structure of the specimens has been studied using transmission electron microscopy, and micromagnetic processes have been observed using an in-situ magnetizing device. The results are used in the interpretation of the MAE and BE measurements.

An in Situ Transmission Electron Microscopy Study During NH3 Ambient Annealing of Cu-Cr Thin Films

1993 ◽  
Vol 317 ◽  
Author(s):  
Z. Atzmon ◽  
R. Sharma ◽  
J.W. Mayer ◽  
S.Q. Hong
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Transmission Electron Microscopy Study ◽  
Nitridation Process ◽  
Transmission Electron ◽  
Heat Treated

ABSTRACTNitridation of Cu-Cr alloy films under an NH3 ambient was studied using in situ transmission electron Microscopy. Cu-Cr thin films (40–100 nm) were deposited on a single crystal NaCl substrate by electron beam coevaporation, and were heat treated up to 750°C at 2.5–3.0 Torr NH3. The films were also vacuum (10-6 Torr) annealed under the same conditions for comparison. Initial observation of Cu and Cr crystallization occurred at 470°C for both environmental conditions. The nitridation process of Cr to form CrN was observed initially at 580°C and was followed by evolution of faceted Cu grain growth in the CrN Matrix.

In-situ TEM studies of magnetization reversal processes in magnetic nanostructures

2005 ◽  
Vol 907 ◽  
Author(s):  
Amanda K Petford-Long ◽  
Thomas Bromwich ◽  
Amit Kohn ◽  
Victoria Jackson ◽  
Takeshi Kasama ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Magnetization Reversal ◽  
Giant Magnetoresistance ◽  
Magnetic Nanostructures ◽  
Magnetic Domain ◽  
Ferromagnetic Material ◽  
In Situ Tem ◽  
Transmission Electron

AbstractOne of the most widely studied types of magnetic nanostructure is that used in devices based on the giant magnetoresistance (GMR) or tunnel magnetoresistance (TMR) phenomena. In order to understand the behaviour of these materials it is important to be able to follow their magnetisation reversal mechanism, and one of the techniques enabling micromagnetic studies at the sub-micron scale is transmission electron microscopy. Two techniques can be used: Lorentz transmission electron microscopy and off-axis electron holography, both of which allow the magnetic domain structure of a ferromagnetic material to be investigated dynamically in real-time with a resolution of a few nanometres. These techniques have been used in combination with in situ magnetizing experiments, to carry out qualitative and quantitative studies of magnetization reversal in a range of materials including spin-tunnel junctions, patterned thin film elements and magnetic antidot arrays. Quantitative analysis of the Lorentz TEM data has been carried out using the transport of intensity equation (TIE) approach.

In Situ TEM Heating Study of the γ Lamellae Formation inside the α2 Matrix of a Ti-45Al-7.5Nb Alloy

2010 ◽  
Vol 146-147 ◽  
pp. 1365-1368 ◽  
Author(s):  
Li Mei Cha ◽  
Helmut Clemens ◽  
Gerhard Dehm ◽  
Zao Li Zhang
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Ex Situ ◽  
In Situ Tem ◽  
Transmission Electron ◽  
Initial Stage ◽  
Heat Treated ◽  
The Matrix ◽  
In Situ Heating

In-situ heating transmission electron microscopy (TEM) was employed to investigate the initial stage of lamellae formation in a high Nb containing γ-TiAl based alloy. A Ti-45Al-7.5Nb alloy (at %), which was heat treated and quenched in a non-equilibrium state such that the matrix consists of ordered a2 grains, was annealed inside a TEM up to 750 °C. The in-situ TEM study reveals that g laths precipitate in the a2 matrix at ~ 750 °C possessing the classical Blackburn orientation relationship, i.e. (0001)a2 // (111)g and [11-20]a2 // <110]g. The microstructure of the in-situ TEM experiment is compared to results from ex-situ heating and subsequent TEM studies.

scholarly journals Microstructural and In Situ Lorentz TEM Domain Characterization of As-Quenched and γ’-Precipitated Co49Ni30Ga21 Monocrystal

Crystals ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 153 ◽  
Author(s):  
Andrzej M. Zak ◽  
Wlodzimierz Dudzinski
Keyword(s):  
Domain Structure ◽  
Heusler Alloys ◽  
Nickel Content ◽  
Magnetic Domain ◽  
Magnetic Domain Structure ◽  
Stripe Domain ◽  
Observation Methods ◽  
Transmission Electron ◽  
Stripe Domain Structure

The article concerns the rarely described magnetic domain structure of Heusler alloys in the case of a single crystal [100]-oriented Co-Ni-Ga alloy. The structure of the magnetic domains of the alloy was compared in two states: in the quenched and additionally aged state. Ageing led to precipitation of the spherical phase γ’ nanoparticles (Co-rich, FCC lattice with a = 0.359 nm). Lorentz transmission electron microscopy observation methods combined with cooling and in situ heating of the sample in the transmission electron microscope in the temperature range from 140 K to 300 K were combined to observe the magnetic domain structure. Significant differences in the dimensions and morphology of magnetic domain boundaries have been demonstrated. The quenched sample showed no change in stripe domain structure when the aged sample showed significant development of branching magnetic structures. This may be due to a change in the chemical composition of the matrix resulting from a decrease in cobalt and nickel content at the expense of precipitations.

Epitaxy and texture analysis of Bi-Sr-Ca-Cu-O thin films on (100) MgO using Transmission Electron Microscopy

1990 ◽  
Vol 48 (4) ◽  
pp. 68-69
Author(s):  
J. T. Sizemore ◽  
D. G. Schlom ◽  
Z. J. Chen ◽  
J. N. Eckstein ◽  
I. Bozovic ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Critical Currents ◽  
Unit Cell ◽  
X Ray Diffraction ◽  
Cell Axis ◽  
Transmission Electron ◽  
Synthesis Procedure

Investigators observe large critical currents for superconducting thin films deposited epitaxially on single crystal substrates. The orientation of these films is often characterized by specifying the unit cell axis that is perpendicular to the substrate. This omits specifying the orientation of the other unit cell axes and grain boundary angles between grains of the thin film. Misorientation between grains of YBa2Cu3O7−δ decreases the critical current, even in those films that are c axis oriented. We presume that these results are similar for bismuth based superconductors and report the epitaxial orientations and textures observed in such films.Thin films of nominally Bi2Sr2CaCu2Ox were deposited on MgO using molecular beam epitaxy (MBE). These films were in situ grown (during growth oxygen was incorporated and the films were not oxygen post-annealed) and shuttering was used to encourage c axis growth. Other papers report the details of the synthesis procedure. The films were characterized using x-ray diffraction (XRD) and transmission electron microscopy (TEM).

Transmission Electron Microscopy of Epitaxial silicides grown by ultra high vacuum deposition

1989 ◽  
Vol 47 ◽  
pp. 462-463
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Transmission Electron

The silicides CoSi2 and NiSi2 are both metallic with the fee flourite structure and lattice constants which are close to silicon (1.2% and 0.6% smaller at room temperature respectively) Consequently epitaxial cobalt and nickel disilicide can be grown on silicon. If these layers are formed by ultra high vacuum (UHV) deposition (also known as molecular beam epitaxy or MBE) their thickness can be controlled to within a few monolayers. Such ultrathin metal/silicon systems have many potential applications: for example electronic devices based on ballistic transport. They also provide a model system to study the properties of heterointerfaces. In this work we will discuss results obtained using in situ and ex situ transmission electron microscopy (TEM).In situ TEM is suited to the study of MBE growth for several reasons. It offers high spatial resolution and the ability to penetrate many monolayers of material. This is in contrast to the techniques which are usually employed for in situ measurements in MBE, for example low energy electron diffraction (LEED) and reflection high energy electron diffraction (RHEED), which are both sensitive to only a few monolayers at the surface.

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