Metal Induced Grain Growth in Germanium and Silicon Thin Films.
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ABSTRACTRapid grain growth has been induced in semiconductor films at relatively low temperatures by allowing contact with metals or metal/semiconductor eutectic melts. Mechanisms by which such enhanced grain growth can occur are discussed, and Diffusion Induced Boundary Migration has been shown to be a plausible explanation for the experimental observations from the Sn/Ge, Al/Ge and Au/Ge systems. Interface migration driven by the decrease in free energy during phase transformations however provides a better explanation of the large Si grains produced on heating the Au/Si samples.
1991 ◽
Vol 95
(11)
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pp. 1410-1413
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2004 ◽
Vol 467-470
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pp. 3-10
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1989 ◽
Vol 39
(1-4)
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pp. 64-67
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2000 ◽
Vol 63
(2)
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pp. 177-184
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