In Situ Analysis of Surface Contaminant Desorption during Low-Temperature Silicon Substrate Cleaning using Reflection Electron Energy Loss Spectrometry

1992 ◽  
Vol 259 ◽  
Author(s):  
Selmer S. Wong ◽  
Shouleh Nikzad ◽  
Channing C. Ahn ◽  
Aimee L. Smith ◽  
Harry A. Atwater

ABSTRACTWe have employed reflection electron energy loss spectrometry (REELS), a surface chemical analysis technique, in order to analyze contaminant coverages at the submonolayer level during low-temperature in situ cleaning of hydrogen-terminated Si(100). The chemical composition of the surface was analyzed by measurements of the C K, O K and Si L2,3 core loss intensities at various stages of the cleaning. These results were quantified using SiC(100) and SiO2 as reference standards for C and O coverage. Room temperature REELS core loss intensity analysis after sample insertion reveals carbon at fractional monolayer coverage. We have established the REELS detection limit for carbon coverage to be 5±2% of a monolayer. A study of temperature-dependent hydrocarbon desorption from hydrogen-terminated Si(100) reveals the absence of carbon on the surface at temperatures greater than 200°C. This indicates the feasibility of epitaxial growth following an in situ low-temperature cleaning and also indicates the power of REELS as an in situ technique for assessment of surface cleanliness.

Author(s):  
R.D. Leapman ◽  
C.R. Swyt

The intensity of a characteristic electron energy loss spectroscopy (EELS) image does not, in general, directly reflect the elemental concentration. In fact, the raw core loss image can give a misleading impression of the elemental distribution. This is because the measured core edge signal depends on the amount of plural scattering which can vary significantly from region to region in a sample. Here, we show how the method for quantifying spectra due to Egerton et al. can be extended to maps.


Author(s):  
T. Dewolf ◽  
D. Cooper ◽  
N. Bernier ◽  
V. Delaye ◽  
A. Grenier ◽  
...  

Abstract Forming and breaking a nanometer-sized conductive area are commonly accepted as the physical phenomenon involved in the switching mechanism of oxide resistive random access memories (OxRRAM). This study investigates a state-of-the-art OxRRAM device by in-situ transmission electron microscopy (TEM). Combining high spatial resolution obtained with a very small probe scanned over the area of interest of the sample and chemical analyses with electron energy loss spectroscopy, the local chemical state of the device can be compared before and after applying an electrical bias. This in-situ approach allows simultaneous TEM observation and memory cell operation. After the in-situ forming, a filamentary migration of titanium within the dielectric hafnium dioxide layer has been evidenced. This migration may be at the origin of the conductive path responsible for the low and high resistive states of the memory.


2006 ◽  
Vol 12 (S02) ◽  
pp. 1138-1139
Author(s):  
MP Oxley ◽  
K van Benthem ◽  
M Varela ◽  
SD Findlay ◽  
LJ Allen ◽  
...  

Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006


Author(s):  
M Stöger-Pollach ◽  
C Hébert ◽  
E C Karl-Rückert ◽  
P Schattschneider ◽  
B Rau ◽  
...  

1999 ◽  
Vol 5 (6) ◽  
pp. 437-444 ◽  
Author(s):  
Stephen B. Rice ◽  
Hazel H. Bales ◽  
John R. Roth ◽  
Allen L. Whiteside

Abstract: A set of uranium compound particles relevant to contaminated soils and other environmental concerns surrounding uranium bioavailability were studied by electron energy-loss spectroscopy (EELS). Core-loss EELS results suggest that uranium 4+ compounds have an energy loss resolvable from 6+ compounds. Shoulders on the uranium O4,5 edge further distinguish UO2 from UF4. Low-loss characteristics distinguish carbon-free uranium oxide specimens on holey substrates. In the presence of carbon, correction techniques must be applied. Uranium oxides, fluorides, and minerals show a tendency toward reduction of uranium toward 4+ under the beam. The electron dose required to achieve the transformation from 6+ to 4+ is more severe than that usually required to obtain satisfactory spectra, but the possibility for reduction should be considered. The conditions for low-loss analysis need not be as vigorous as those for core losses, and can be done without altering the valence of most oxides.


2000 ◽  
Vol 6 (S2) ◽  
pp. 186-187
Author(s):  
D. A. Pankhurst ◽  
G. A. Botton ◽  
C. J. Humphreys

It has been demonstrated that electron energy loss spectrometry (EELS) can be used to probe the electronic structure of materials on the near-atomic scale. The electron energy loss near edge structure (ELNES) observed after the onset of a core edge reflects a weighted local density of final states to which core electrons are excited by fast incident electrons. Lately ‘atomic resolution EELS’ and ‘column-by-column spectroscopy’ have become familiar themes amongst the EELS community. The next generation of STEMs, equipped with spherical aberration (Cs) correctors and electron beam monochromators, will have sufficient spatial and energy resolution, along with the superior signal to noise required, to detect small changes in the ELNES from atomic column to atomic column.Core loss ELNES provides information about unoccupied states, but the structure observed in spectra is sensitive to changes in the underlying occupied states, and thus to the bonding in the material.


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