Low Temperature Selective Area Chemical Vapor Deposition of Gold Films: Growth and Characterization

1992 ◽  
Vol 282 ◽  
Author(s):  
Paul F. Seidler ◽  
Steven P. Kowalczyk ◽  
Mark M. Banaszak Holl ◽  
John J. Yurkas ◽  
Maurice H. Norcott ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Room Temperature ◽  
Chemical Vapor ◽  
Growth Behavior ◽  
Gold Films ◽  
High Quality ◽  
Selective Area ◽  
Cleaning Procedures

ABSTRACTSubstrate-selective, low-temperature chemical vapor deposition of high quality gold filmswas obtained with the new precursor ethyl(trimethylphosphine)gold(I) in an ultrahigh vacuum reactor designed to handle wafers up to 3 inches in diameter. Growth behavior at temperatures as low as room temperature as well as substrate pre-cleaning procedures are presented. Activation energies of 35.1 ± 0.4 kcal mol−1 and 18.3 ± 0.7 kcal mol−1 were found for growth of gold films on gold and copper substrates, respectively.

Low Temperature Critical Growth of High Quality Nitrogen Doped Graphene on Dielectrics by Plasma-Enhanced Chemical Vapor Deposition

ACS Nano ◽  
2015 ◽  
Vol 9 (1) ◽  
pp. 164-171 ◽  
Author(s):  
Dacheng Wei ◽  
Lan Peng ◽  
Menglin Li ◽  
Hongying Mao ◽  
Tianchao Niu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Critical Growth ◽  
High Quality ◽  
Nitrogen Doped ◽  
Nitrogen Doped Graphene ◽  
Doped Graphene

High-Quality Carbon Nanotube Growth at Low Temperature by Pulse-Excited Remote Plasma Chemical Vapor Deposition

2008 ◽  
Vol 1 ◽  
pp. 034004 ◽  
Author(s):  
Yuichi Yamazaki ◽  
Naoshi Sakuma ◽  
Masayuki Katagiri ◽  
Mariko Suzuki ◽  
Tadashi Sakai ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Nanotube ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
High Quality ◽  
Plasma Chemical Vapor Deposition ◽  
Carbon Nanotube Growth ◽  
Nanotube Growth

Low‐temperature selective‐area deposition of metals: Chemical vapor deposition of gold from ethyl(trimethylphosphine)gold(I)

1993 ◽  
Vol 62 (13) ◽  
pp. 1475-1477 ◽  
Author(s):  
M. M. Banaszak Holl ◽  
P. F. Seidler ◽  
S. P. Kowalczyk ◽  
F. R. McFeely
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Selective Area ◽  
Area Deposition
Sign in / Sign up

Export Citation Format

Share Document