Growth of Cubic GAN on (001) GAAS

1995 ◽  
Vol 395 ◽  
Author(s):  
O. Brandt ◽  
H. Yang ◽  
A. Trampert ◽  
K. H. Ploog

ABSTRACTWe present a study of the growth of cubic GaN films on (001) GaAs by molecular beam epitaxy. Our investigations focus on the nucleation stage as well as on the subsequent growth of GaN. The phenomenon of epitaxial growth at this extreme mismatch (20%) is demonstrated to arise from a coincidence lattice between GaAs and GaN. The presence of a high-density of stacking faults in the GaN layer is explained within this understanding as being a natural consequence of the coalescence of perfectly relaxed nuclei. We furthermore analyze the growth kinetics of GaN via the surface reconstruction transitions observed upon an impinging Ga flux, from which we obtain both the desorption rate of Ga as well as the diffusion coefficient of Ga adatoms on the Ga-stabilized GaN surface. The diffusivity of Ga is found to be very low at the growth temperatures commonly used during molecular beam epitaxy, which provides an explanation for the microscopic surface roughness observed on our samples.

Author(s):  
A. Barski ◽  
U. Rössner ◽  
J. L. Rouviere ◽  
M. Arlery

Thermal treatment under propane at 1300-1400 °C has been used to prepare Silicon (001) wafers for subsequent growth of cubic GaN and AlN by Electron Cyclotron Resonance Plasma Assisted Molecular Beam Epitaxy (ECRMBE). Thermal treatment of Silicon wafers under propane, used in this experiment, produced a very thin (40 Å) layer of cubic SiC on the Silicon (001) surface. Despite an extremely low thickness of as-produced SiC layer, high quality cubic GaN has been successfully grown. The cubic form of AlN grown on the SiC(40Å)/Si(001) surface has also been observed despite a very high density of stacking faults.


2004 ◽  
Vol 84 (18) ◽  
pp. 3684-3686 ◽  
Author(s):  
E. Monroy ◽  
E. Sarigiannidou ◽  
F. Fossard ◽  
N. Gogneau ◽  
E. Bellet-Amalric ◽  
...  

1987 ◽  
Vol 94 ◽  
Author(s):  
S. B. Ogale ◽  
M. Thomsen ◽  
A. Madhukar

ABSTRACTComputer simulations of III-V molecular beam epitaxy (MBE) show that surface reconstruction induced modulation of kinetic rates could give rise to ordering in alloys. Results are also presented for the possible influence of an external ion beam in achieving low temperature epitaxy as well as smoother growth front under usual conditions.


2000 ◽  
Vol 639 ◽  
Author(s):  
Ryuhei Kimura ◽  
Kiyoshi Takahashi ◽  
H. T. Grahn

ABSTRACTAn investigation of the growth mechanism for RF-plasma assisted molecular beam epitaxy of cubic GaN films using a nitrided AlGaAs buffer layer was carried out by in-situ reflection high energy electron diffraction (RHEED) and high resolution X-ray diffraction (HRXRD). It was found that hexagonal GaN nuclei grow on (1, 1, 1) facets during nitridation of the AlGaAs buffer layer, but a highly pure, cubic-phase GaN epilayer was grown on the nitrided AlGaAs buffer layer.


2002 ◽  
Vol 299 (1) ◽  
pp. 79-84 ◽  
Author(s):  
M Xu ◽  
C.X Liu ◽  
H.F Liu ◽  
G.M Luo ◽  
X.M Chen ◽  
...  

2011 ◽  
Vol 8 (5) ◽  
pp. 1495-1498 ◽  
Author(s):  
T. Schupp ◽  
T. Meisch ◽  
B. Neuschl ◽  
M. Feneberg ◽  
K. Thonke ◽  
...  

2020 ◽  
Vol 699 ◽  
pp. 137915 ◽  
Author(s):  
S.A. García Hernández ◽  
V.D. Compeán García ◽  
E. López Luna ◽  
M.A. Vidal

2020 ◽  
Vol 128 (12) ◽  
pp. 125706
Author(s):  
B. E. Zendejas-Leal ◽  
Y. L. Casallas-Moreno ◽  
C. M. Yee-Rendon ◽  
G. I. González-Pedreros ◽  
J. Santoyo-Salazar ◽  
...  

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