Substrate Issues for Advanced Display Technologies

1997 ◽  
Vol 471 ◽  
Author(s):  
Dawne M. Moffatt-Fairbanks ◽  
David L. Tennent

ABSTRACTThe glass substrate plays a crucial role in the successful performance of advanced flat panel displays (FPDs). These FPD technologies include active-matrix liquid crystal displays (AMLCD) and Plasma Displays (PDP). Although these displays are different in the way in which they operate, there are several common substrate requirements, all of which are determined by the process for making the entire display. These include issues relating to substrate size, thermal shrinkage, high temperature stability, and substrate surface quality.While AMLCD technology is moving toward larger sizes, PDPs are currently large size displays, requiring large glass substrates. The primary issue in using larger substrates is minimizing distortion of the glass during high temperature processes, both viscous sag and shrinkage. These are related to the high temperature thermal stability which, in turn, is largely determined by the strain point and thermal history of the substrate. Finally, thickness uniformity and surface flaws are critical to the performance of the final display.Coming's Code 1737 glass substrate meets the requirements for AMLCDs and has become the industry standard. Corning/Saint-Gobain Code CS25 glass is a new glass that has significant benefits over soda-lime glass for PDP applications. This paper will discuss these two glasses in terms of the above-mentioned issues.


2015 ◽  
Vol 26 (7) ◽  
pp. 4708-4715 ◽  
Author(s):  
Naba R. Paudel ◽  
Corey R. Grice ◽  
Chuanxiao Xiao ◽  
Yanfa Yan


2018 ◽  
Vol 102 (6) ◽  
pp. 3341-3353 ◽  
Author(s):  
Jean‐Thomas Fonné ◽  
Ekaterina Burov ◽  
Emmanuelle Gouillart ◽  
Sergey Grachev ◽  
Hervé Montigaud ◽  
...  


Chemosensors ◽  
2020 ◽  
Vol 8 (2) ◽  
pp. 40
Author(s):  
Victor V. Petrov ◽  
Ekaterina M. Bayan ◽  
Soslan A. Khubezhov ◽  
Yuri N. Varzarev ◽  
Maria G. Volkova

ZnO–SnO2 films with a thickness of up to 120 nm have been prepared on glass substrates by pyrolysis at 550 °C of three spin-coated organic precursors films. Films of four compositions were obtained on glass substrates. The prepared films were characterized by SEM, XRD, and XPS analysis. Electrophysical studies have shown that the activation energy of the temperature conductivity for all films is equal to 0.75 eV. While the gas-sensitive characteristics by CO treatment in low concentrations at a temperature of 200–300 °C was studied, their rapid degradation was found. Studies using the XPS method have shown that ZnO–SnO2 films contain sodium, which is diffused from the soda-lime glass substrate during the film formation. Studies of XPS spectra after CO treatment have shown that the film surface is almost 50% composed of adsorbed water molecules and OH groups. OH groups are part of the sodium, tin, and zinc hydroxides formed on the surface. In addition, zinc hydrocarbonates are formed on the surface of the films. The detected insoluble compounds lead to the degradation of gas-sensitive properties of ZnO–SnO2 films.



Author(s):  
Sepehr Sadeh ◽  
Kunal Mitra

Lasers are widely used as high-accuracy tools for material processing. Different types of lasers such as CO2, Nd:YAG, and excimer lasers are used in different operating modes such as continuous wave, pulsed or Q-switched. Volumes of materials and their composition, structure, and properties can be controlled or modified by varying laser pulses. In this research, by using laser as a material processing tool, an experimental method was developed for laser induced implantation doping of glass substrates with conductive metals. Experiments were performed on glass samples using Q-switched Nd:YAG lasers. Gold, silver, and copper were used as conductive dopant materials. Initial experiments were performed using nickel as a catalyst. Effect of the catalyst on the composition of implanted dopant material was observed using Large Area Rapid Imaging Analytical Tool (LARIAT). Through further experiment, the effect of several parameters such as beam fluence, scanning speed, pulse repetition frequency, wavelength, substrate temperature, dopant material, and glass substrate material on the morphology of heat affected zones were investigated by optical microscopy (OM). Depth of penetration in doped glass samples was measured for different substrate temperatures by means of a laser displacement sensor. The effect of beam fluence and glass substrate thickness on depth of penetration was investigated. The results of these non-destructive measurements were verified using scanning electron microscopy (SEM). Based on optical observations, morphological characteristics of the heat affected zone were assessed in order to obtain the best parameter settings in different experiments. These settings were defined by factors such as the number and size of cracks in glass substrates, and the quality of the distribution of dopant metal over the scanned pattern. While using a catalyst with substrates at room temperature, the best parameter settings were obtained at wavelength of 532 nm, pulse repetition frequency of 6 kHz, beam fluence of 0.36 J/cm2, and scanning speed of 0.10 m/s. By removing the catalyst, these settings were changed to 355 nm, 10 kHz, 0.09 J/cm2, and 0.01 m/s for gold sputtered soda-lime glass substrate at 500 °C. For beam fluence values ranging from 0.06 J/cm2 to 0.38 J/cm2, the obtained values for average depth of penetration were 255 μm and 187 μm in 1 mm and 3 mm thick soda-lime glass substrates respectively. Further development of this implantation method could lead to implantation of electronic circuits in transparent substrates, inspiring the evolution of transparent electronic devices such as transparent smart phones, smart windows and displays, and lighting products in the future.



2007 ◽  
Vol 124-126 ◽  
pp. 1509-1512 ◽  
Author(s):  
Jung Geun Jhin ◽  
Jae Hong Choi ◽  
Jong Hyeob Baek ◽  
Dong Jin Byun

The degree of preference of thin anatase TiO2 films prepared by CVD for the <112> orientation was enhanced by pretreating the soda-lime glass substrates with a plasma. The relationships between the preferred orientation and plasma pretreatments were investigated. It was founded that the TiO2 films on the plasma pretreated soda-lime glass substrates exhibited a higher degree of preference for the (112) orientation than those without the pretreatment. To confirm the effect of the plasma pretreatments on the soda-lime glass substrates, TOF-SIMS, contact angle measurement and TEM were used to determine the changes in the components, surface energy and crystallinity of the substrates, respectively. It was found the components added as network modifiers, such as Na+, Ca2+, and K+ ions, was depleted in the surface region of the substrates after the plasma pretreatment, and that the surface energy of the substrates was increased. Finally, it was observed that the substrate surface was changed from an amorphous phase to polycrystalline. To sum up, it was assumed that the surface of the soda-lime glass substrates with their partially crystalline, namely poly-crystalline, structures artificially induced the thin anatase TiO2 films to develop with a <112>-preferred orientation. In conclusion, the plasma pretreatment of the glass substrate caused the TiO2 thin films to exhibit a higher preference for the <112> orientation, thereby optimizing their photocatalytic efficiency.



Alloy Digest ◽  
1989 ◽  
Vol 38 (1) ◽  

Abstract UNS NO6455 is a nickel-chromium-molybdenum alloy with outstanding high-temperature stability as shown by high ductility and corrosion resistance even after long-time aging in the range 1200-1900 F. The alloy also has excellent resistance to stress-corrosion cracking and to oxidizing atmospheres up to 1900 F. This datasheet provides information on composition, physical properties, hardness, elasticity, and tensile properties. It also includes information on corrosion resistance as well as forming, heat treating, machining, and joining. Filing Code: Ni-367. Producer or source: Nickel and nickel alloy producers.



Alloy Digest ◽  
1987 ◽  
Vol 36 (7) ◽  

Abstract UNS No. R54620 is an alpha-beta titanium alloy. It has an excellent combination of tensile strength, creep strength, toughness and high-temperature stability that makes it suitable for service to 1050 F. It is recommended for use where high strength is required. It has outstanding advantages for long-time use at temperatures to 800 F. This datasheet provides information on composition, physical properties, elasticity, tensile properties, and bend strength as well as creep. It also includes information on high temperature performance and corrosion resistance as well as forming, heat treating, machining, joining, and surface treatment. Filing Code: Ti-86. Producer or source: Titanium alloy mills.



2021 ◽  
Vol 300 ◽  
pp. 110503
Author(s):  
Jaspal Singh ◽  
Agathe Dean ◽  
Sangeeta Prakash ◽  
Bhesh Bhandari ◽  
Nidhi Bansal


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