Atomic-Scale Structure and Properties of Thin Epitaxial SrRuO3 Films Grown on SrTiO3 (100) by Pulsed Laser Deposition

1998 ◽  
Vol 541 ◽  
Author(s):  
K.M. Satyalakshmi ◽  
N. D. Zakharov ◽  
D. Hesse ◽  
G. Koren

AbstractTransition metal oxides with perovskite structure exhibit a wide range of electrical properties. SrRuO3 (SRO), a perovskite oxide with high conductivity, finds applications as an electrode layer in ferroelectric devices and as a barrier layer in superconductor-normal metal-superconductor (SNS) Josephson junctions involving high Tc superconductors. Here we report on the structure and properties of thin SRO films on SrTiO3 (100) substrates grown by pulsed laser deposition. AFM investigations revealed that the SRO films exhibit island growth. The island size increases with thickness, and at a typical thickness of about 20 nm a connected network of islands is formed. The resistivity of the SRO films grown at different substrate temperatures (700 °C - 850 °C) exhibits metallic behavior with a ferromagnetic transition at 150 K. The films with typical thicknesses of 20 nm, grown at a substrate temperature of 775 °C exhibited the lowest resistivity of 200 μΩ-cm at 300 K, whereas the films grown at lower (700 °C) and higher (850 °C) temperatures showed a much higher resistivity at 300 K. By AFM and high resolution TEM investigations, this behavior is correlated with the atomicscale structure of the films. The film with the lowest room temperature resistivity showed an almost defect-free orthorhombic structure, whereas the film grown at 850 °C contained structural defects in high density, such as SrO-rich antiphase boundaries and twins located at the boundaries between the islands. The films grown at 700 °C showed a cubic perovskite structure, which is obviously the reason for their high resistivity.

2000 ◽  
Vol 15 (10) ◽  
pp. 2249-2265 ◽  
Author(s):  
Jeanne M. McGraw ◽  
John D. Perkins ◽  
Falah Hasoon ◽  
Philip A. Parilla ◽  
Chollada Warmsingh ◽  
...  

We have found that by varying only the substrate temperature and oxygen pressure five different crystallographic orientations of V2O5 thin films can be grown, ranging from amorphous to highly textured crystalline. Dense, phase-pure V2O5 thin films were grown on SnO2/glass substrates and amorphous quartz substrates by pulsed laser deposition over a wide range of temperatures and oxygen pressures. The films' microstructure, crystallinity, and texturing were characterized by electron microscopy, x-ray diffraction, and Raman spectroscopy. Temperature and oxygen pressure appeared to play more significant roles in the resulting crystallographic texture than did the choice of substrate. A growth map summarizes the results and delineates the temperature and O2 pressure window for growing dense, uniform, phase-pure V2O5 films.


2006 ◽  
Vol 980 ◽  
Author(s):  
Noha Farghal ◽  
Moustafa Yehia Ghannam ◽  
Amr M. Shaarawi ◽  
Hussein El Samman ◽  
Philippe Soussan ◽  
...  

AbstractIn this work, the material properties of AuNi5 films prepared by Pulsed Laser Deposition (PLD) to be used as contact materials in RF MEMS switches are investigated. PLD is used because it provides good wide range thickness control (few nanometers to tens of microns) while preserving ablation target stoichiometry. Films with thickness in the range 50 - 450 nm were deposited at Laser energy density (fluence) in the range 0.55 - 1.38 J.cm-2 on silicon substrates at room temperature. An aperture was placed between the plume and the substrate to filter out large particulates. The presence of the aperture reduced surface roughness from 8.5 nm to 4.3 nm as determined by optical profilometry. In addition, the presence of the aperture during deposition has been found to affect film stoichiometry. The latter was evaluated using X-ray Fluorescence and the Nickel content has been found to vary in the range 1.1 - 9.5%. Only films deposited with the aperture removed maintain target stoichiometry (5.2% Ni). Hence, it is believed that the presence of the aperture causes non-congruent transfer. The Nickel content within the range under investigation has practically no effect on film morphology or hardness. Laser fluence, however, has been found to be the dominant factor determining film properties. Finally, 100 µm wide AuNi5 strips 290 nm and 130 nm thick deposited at room temperature have been successfully formed on silicon wafers by lift-off photolithography.


2003 ◽  
Vol 780 ◽  
Author(s):  
B. Luther-Davies ◽  
V. Z. Kolev ◽  
M. J. Lederer ◽  
R. Yinlan ◽  
M. Samoc ◽  
...  

AbstractUltra-fast pulsed laser deposition using high-repetition-rate short-pulse lasers has been shown to provide high optical quality, super smooth thin films free of scattering centres. The optimized process conditions require short ps or sub-ps pulses with repetition rate in the range 1-100 MHz, depending on the target material. Ultra-fast pulsed laser deposition was used to successfully deposit atomically-smooth, 5micron thick As2S3 films. The as-deposited films were photosensitive at wavelengths close to the band edge (≈520 nm) and waveguides could be directly patterned into them by photo-darkening using an Argon ion or frequency doubled Nd:YAG laser. The linear and nonlinear optical properties of the films were measured as well as the photosensitivity of the material. The optical losses in photo-darkened waveguides were <0.2 dB/cm at wavelengths beyond 1200nm and <0.1 dB/cm in as-deposited films. The third order nonlinearity, n2,As2S3, was measured using both four-wave mixing and the z-scan technique and varied with wavelength from 100 to 200 times fused silica (n2,Silica ≈3×10-16 cm2/W) between 1500nm and 1100nm with low nonlinear absorption.Encouraged by the Ultrafast laser deposition results, we have built a new specialized modelocked picosecond laser system for deposition of optical films and for laser formation of nanoclusters. The newly developed “state of the art” powerful Nd:YVO laser can operate over a wide range of wavelengths, intensities, and repetition rates in MHz range. A brief description of the 50W laser installation is presented.


2005 ◽  
Vol 19 (01n03) ◽  
pp. 533-535
Author(s):  
J. H. HAO ◽  
J. GAO

We have developed a process to grow SrTiO 3 ( STO ) thin films showing single (110) orientation directly on Si by means of pulsed laser deposition technique. The growth of STO films directly on Si has been described. The crystallinity of the grown STO films was characterized by X-ray diffraction analysis of θ-2θ scan and rocking curve. Our results may be of interest for better understanding of the growth based on the perovskite oxide thin films on silicon materials.


2010 ◽  
Vol 207 (3) ◽  
pp. 516-520 ◽  
Author(s):  
M. Popescu ◽  
A. Velea ◽  
F. Sava ◽  
A. Lőrinczi ◽  
A. Tomescu ◽  
...  

2006 ◽  
Vol 253 (3) ◽  
pp. 1522-1527 ◽  
Author(s):  
Sang-Moo Park ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara ◽  
Paik-Kyun Shin

RSC Advances ◽  
2018 ◽  
Vol 8 (1) ◽  
pp. 367-373 ◽  
Author(s):  
Xiaofeng Wu ◽  
Keke Huang ◽  
Long Yuan ◽  
Shouhua Feng

We elucidate a facile method for the preparation of perovskite manganite nanotubes using a sacrificial template assisted pulsed laser deposition technique.


1993 ◽  
Vol 327 ◽  
Author(s):  
Randolph E. Treece ◽  
James S. Horwitz ◽  
Douglas B. Chrisey

AbstractThin films of diamond and diamond-like carbon (DLC) are technologically important materials that serve as hard, scratch resistant and chemically inert coatings for tools and optics. Recent calculations suggest that β-C3N4 should be harder than diamond. We have deposited carbon nitride (CNx) thin films by pulsed laser deposition. The films were grown from a graphite target in a nitrogen background. The nitrogen source was either (a) a N2 gas atmosphere, or (b) a N2+/N+ ion beam generated by a Kaufman ion gun. A wide range of deposition parameters were investigated, such as deposition pressure (0.3-900 mTorr N2), substrate temperature (50 and 600°C), and laser fluence (1-4 J/cm2) and laser repetition rate (1-10 Hz). The films have been characterized by Rutherford Backscattering Spectroscopy, thin-film X-ray diffraction, scanning electron microscopy, and micro-Raman spectroscopy. In general, the films were nitrogen deficient with a maximum nitrogen to carbon ratio (N/C) of 0.45 and a shift in the G band Raman peak consistent with amorphous CNx (a-CNx).


2006 ◽  
Vol 45 (10A) ◽  
pp. 7860-7865 ◽  
Author(s):  
Bai Lin Zhu ◽  
Xiao Hua Sun ◽  
Shi Shang Guo ◽  
Xing Zhong Zhao ◽  
Juan Wu ◽  
...  

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