Finite Element Modeling of Nanoindentation Measurements of Crystalline and Amorphous Si
ABSTRACTNanoindentation testing of amorphous Si layers, formed by self-ion implantation, has been performed, and their mechanical properties compared to crystalline Si. The data was analyzed using finite element modeling of the indentation measurement, allowing the properties of the thin amorphous layers to be separated from those of the underlying material. By modeling the materials as isotropic, elastic-plastic solids with the Mises yield criterion, the amorphous Si is shown to have a hardness about 15% lower than crystalline Si and an elastic modulus about 10% lower. Electron and atomic force microscopies of the indents indicate that the amorphous Si does not undergo phase changes during indentation, and that it may be somewhat more ductile than crystalline Si.