New Approach Towards The Deposition of I-III-VI Thin Films

2001 ◽  
Vol 692 ◽  
Author(s):  
Mohammad Afzaal ◽  
David Crouch ◽  
Paul O'Brien ◽  
Jin-Ho Park

AbstractThe ternary chalcopyrite semiconductor Cu(In/Ga)(Se/S)2 is currently used as an absorber layer in high efficiency thin film solar cells. In this study, various types of I-III-VI (I = Cu, III = Ga or In, VI = S or Se) thin films (CuGaS2, CuInS2 and CuInSe2) were prepared from a series of organometallic precursors, M[(S/Se)2CNMeR]n (M = Cu, In, Ga; R = alkyl) by aerosol-assisted chemical vapour deposition (AACVD). In contrast to the metal alkyl compounds, MR3 (M = In and Ga; R = alkyl), which are pyrophoric, the precursors are easy to synthesize by one-pot reactions and are air stable. The optimum growth temperature for the preparation of these films on glass substrates using aerosol-assisted chemical vapour deposition (AACVD) was found to be above 400 °C in terms of crystallinity, although deposition does occur at lower temperatures. The films have been characterised using XRPD, SEM and EDS. SEM analyses show all films are microcrystalline. XRPD results show evidence of the crystalline nature of theses films. The results of this comprehensive study are presented and discussed.

2002 ◽  
Vol 730 ◽  
Author(s):  
Mohammad Afzaal ◽  
Theivanayagam C. Deivaraj ◽  
Paul O'Brien ◽  
Jin-Ho Park ◽  
Jagadese J. Vittal

AbstractThe ternary chalcopyrite semiconductors I-III-VI are currently used for photovoltaic solar cell applications. In this study, AgIn5S8 thin films were prepared from a series of single-source bimetalorganic precursors, e.g. [(PPh3)2AgIn(SC{O}R)4] (R = alkyl) by aerosol assisted chemical vapour deposition (AA-CVD). The compounds can be used as single-source precursors for the deposition of ternary compounds (I-III-VI) by one-pot reaction using CVD process and they are found to be air stable, which is favourable in comparison with metal alkyl compounds, which are found to be pyrophoroic. The optimum growth temperature for the preparation of these films on glass and Si(100) substrates, was found to be above 350°C in terms of crystallinity, although deposition occurred at low temperatures. The films have been investigated using XRD, SEM and EDS. SEM analysis shows that all films are microcrystalline but have different morphologies depending on the growth temperatures. XRD results show evidence of the crystalline nature of these films. The results of this comprehensive study are presented and discussed.


2018 ◽  
Vol 6 (3) ◽  
pp. 588-597 ◽  
Author(s):  
Dominic B. Potter ◽  
Michael J. Powell ◽  
Ivan P. Parkin ◽  
Claire J. Carmalt

Aluminium/gallium co-doped ZnO (AGZO), indium/gallium co-doped ZnO (IGZO), and aluminium/indium co-doped ZnO (AIZO) thin films were synthesised on glass substrates via aerosol assisted chemical vapour deposition (AACVD).


2015 ◽  
Vol 3 (44) ◽  
pp. 22311-22315 ◽  
Author(s):  
Shuqun Chen ◽  
Martyn McLachlan ◽  
Andrei Sapelkin ◽  
Russell Binions

Aerosol assisted chemical vapour deposition has been used to fabricate transparent conductive ZnO thin films with highly hexagonal, textured surfaces and ultra high haze on silica glass substrates.


2019 ◽  
Vol 48 (4) ◽  
pp. 1436-1442 ◽  
Author(s):  
Temidayo Oyetunde ◽  
Mohammad Afzaal ◽  
Mark A. Vincent ◽  
Paul O'Brien

Aerosol-assisted chemical vapour deposition (AACVD) of Cd[(SPiPr2)(SePiPr2)N]2 yields hexagonal cadmium selenide and monoclinic cadmium phosphide films on glass substrates between 475 and 525 °C at different argon flow rates.


RSC Advances ◽  
2014 ◽  
Vol 4 (91) ◽  
pp. 49723-49728 ◽  
Author(s):  
Sapna D. Ponja ◽  
Sanjayan Sathasivam ◽  
Ivan P. Parkin ◽  
Claire J. Carmalt

Aerosol assisted chemical vapour deposition (AACVD) was employed to synthesise highly transparent and conductive ZnO, fluorine or aluminium doped and aluminium–fluorine co-doped ZnO thin films on glass substrates at 450 °C.


RSC Advances ◽  
2015 ◽  
Vol 5 (16) ◽  
pp. 11812-11817 ◽  
Author(s):  
Sanjayan Sathasivam ◽  
Ranga R. Arnepalli ◽  
Kaushal K. Singh ◽  
Robert J. Visser ◽  
Christopher S. Blackman ◽  
...  

The novel deposition of GaAs thin films on glass substrates from a solution based route involving the aerosol assisted chemical vapour deposition (AACVD) of As(NMe2)3 and GaMe3 dissolved in toluene is reported.


RSC Advances ◽  
2014 ◽  
Vol 4 (89) ◽  
pp. 48507-48515 ◽  
Author(s):  
Yothin Chimupala ◽  
Geoffrey Hyett ◽  
Robert Simpson ◽  
Robert Mitchell ◽  
Richard Douthwaite ◽  
...  

Mixed phase anatase TiO2 and TiO2(B) thin films were synthesized using Low Pressure Chemical Vapour Deposition (LPCVD) onto glass substrates.


2014 ◽  
Vol 50 (92) ◽  
pp. 14328-14330 ◽  
Author(s):  
Punarja Kevin ◽  
Sajid N. Malik ◽  
Mohammad A. Malik ◽  
Paul O'Brien

SnSe and Cu2SnSe3thin films have been deposited onto glass substrates by AACVD from molecular precursors.


2002 ◽  
Vol 730 ◽  
Author(s):  
Mohammad Afzaal ◽  
David Crouch ◽  
Paul O'Brien ◽  
Jin-Ho Park

AbstractThin films of CdS and CdSe have been deposited on glass substrates by low pressure metal-organic chemical vapour deposition (LP-MOCVD) using Cd[(EPiPr2)2N]2 (E = S, Se) as single-source precursors. These air-stable precursors are volatile, making them suitable for the deposition of thin films. As-deposited films were crystalline metal chalcogenides, as confirmed by X-ray powder diffraction (XRD), and their morphologies were studied by scanning electron microscopy (SEM).


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