Effects of the Schottky electrode structure in GaN based UV-VUV (50-360 nm) photodetector

2001 ◽  
Vol 693 ◽  
Author(s):  
Atsushi Motogaito ◽  
Keiichi Ohta ◽  
Kazumasa Hiramatsu ◽  
Youichiro Ohuchi ◽  
Kazuyuki Tadatomo ◽  
...  

AbstractCharacterization of Schottky barrier UV detectors with a comb-shaped electrode and a transparent electrode for VUV region using synchrotron radiation was carried out. These Schottky type detectors are effective to operate in UV and VUV light (50<l >360 nm). In particular, the latter realizes high responsivity (0.01 A/W for VUV light) and no photoemission of Au and GaN. The penetration depth for VUV light was estimated to 0.01 m. So the VUV light was absorbed in near the surface of i-GaN layer or the interface of Au and i-GaN layer.

2003 ◽  
Vol 798 ◽  
Author(s):  
Atsushi Motogaito ◽  
Kazumasa Hiramatsu ◽  
Yasuhiro Shibata ◽  
Hironobu Watanabe ◽  
Hideto Miyake ◽  
...  

ABSTRACTCharacterizations of transparent Schottky barrier GaN and AlGaN UV detectors in the vacuum UV (VUV) and soft X-ray (SX) region using synchrotron radiation are described. In the GaN UV detectors, the responsivity achieved about 0.05 A/W at 95 eV (13 nm). Thus, their device performance is shown between 3.4 and 100 eV (10 and 360 nm). Furthermore, the high responsivity spectra were realized by using AlGaN Schottky UV detectors consisting of Al0.5Ga0.5N on AlN epitaxial layer.


2001 ◽  
Vol 40 (Part 2, No. 4B) ◽  
pp. L368-L370 ◽  
Author(s):  
Atsushi Motogaito ◽  
Motoo Yamaguchi ◽  
Kazumasa Hiramatsu ◽  
Masahiro Kotoh ◽  
Youichiro Ohuchi ◽  
...  

2015 ◽  
Vol 24 (10) ◽  
pp. 108506
Author(s):  
Qing-Tao Chen ◽  
Yong-Qing Huang ◽  
Jia-Rui Fei ◽  
Xiao-Feng Duan ◽  
Kai Liu ◽  
...  

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Hikaru Miura ◽  
Yuichi Kurihara ◽  
Masayoshi Yamamoto ◽  
Aya Sakaguchi ◽  
Noriko Yamaguchi ◽  
...  

2012 ◽  
Vol 45 (3) ◽  
pp. 307-312 ◽  
Author(s):  
Takamichi Shinohara ◽  
Tomoko Shirahase ◽  
Daiki Murakami ◽  
Taiki Hoshino ◽  
Moriya Kikuchi ◽  
...  

2002 ◽  
Vol 742 ◽  
Author(s):  
T. Kimoto ◽  
K. Hashimoto ◽  
K. Fujihira ◽  
K. Danno ◽  
S. Nakamura ◽  
...  

ABSTRACTHomoepitaxial growth, impurity doping, and diode fabrication on 4H-SiC(11–20) and (03–38) have been investigated. Although the efficiency of nitrogen incorporation is higher on the non-standard faces than on (0001), a low background doping concentration of 2∼3×1014 cm-3 can be achieved. On these faces, boron and aluminum are less effectively incorporated, compared to the growth on off-axis (0001). 4H-SiC(11–20) epilayers are micropipe-free, as expected. More interestingly, almost perfect micropipe closing has been realized in 4H-SiC (03–38) epitaxial growth. Ni/4H-SiC(11–20) and (03–38) Schottky barrier diodes showed promising characteritics of 3.36 kV-24 mΩcm2 and 3.28 kV–22 mΩcm2, respectively. The breakdown voltage of 4H-SiC(03–38) Schottky barrier diodes was significantly improved from 1 kV to above 2.5 kV by micropipe closing.


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