Electron Spin Resonance and Electronic Conductivity in Moderately Doped n-type Microcrystalline Silicon as a Probe for the Density of Gap States
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AbstractElectron spin resonance accompanied by conductivity measurements in n-type microcrystalline silicon with different doping concentrations and different structure compositions has been applied for the study of the density of gap states and the influence of these states on charge carrier density. We studied doping concentrations close to the defect density where the doping induced Fermi level (EF) shift is determined by compensation of gap states. We found a correlation between the EF shift, the intrinsic defect density and structural changes.
2000 ◽
Vol 266-269
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pp. 511-518
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1984 ◽
Vol 96
(4)
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pp. 1021-1026
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2004 ◽
Vol 18
(01)
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pp. 63-70
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