Patterned Deposition from Compressed Carbon Dioxide
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ABSTRACTCompressed CO2 is employed as the solvent for the deposition of polymers onto patterned surfaces created by a lithographic technique. This deposition technique should have wide applicability in the deposition of organic and polymeric materials for optoelectronic devices. The advantage of controlled deposition confers a further benefit in the control of the patterned surface. In a specific example a perfluorinated polymer was dissolved in liquid carbon dioxide. The polymer solution was deposited by use of a nozzle onto a pre-patterned surface. The resulting polymer film showed a clear image of the original pattern as measured by optical microscopy.
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2006 ◽
Vol 7
(8)
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pp. n/a-n/a
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1969 ◽
Vol 14
(4)
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pp. 473-475
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2006 ◽
Vol 45
(10)
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pp. 3434-3437
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2017 ◽
Vol 44
(12)
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pp. 19-22
2019 ◽
Vol 132
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pp. 529-538
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