A Single Source Approach To Deposition Of Nickel and Palladium Sulfide Thin Films By LP-MOCVD

ABSTRACTCompounds of the type M(S2CNRR’)2, M = Ni(II), Pd(II), RR' = Et2, MeEt and MenBu, have been synthesized and used as single-source precursors for the fabrication of NiS and PdS thin films via low-pressure (LP) metal-organic chemical vapour deposition (MOCVD). The phase of nickel sulfide films deposited on glass substrates was found to be NiS1.03 or a mixture of NiS1.03 and NiS, whilst palladium sulfide films were only tetragonal PdS. The films have been characterized by X-ray powder diffraction (XRPD), scanning electron microscopy (SEM), transition electron microscopy (TEM) and energy dispersive analysis of X-rays (EDAX).

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Metal-Organic Chemical Vapour Deposition of II-VI Semiconductor Thin Films Using Single-Source Approach

MRS Proceedings ◽

10.1557/proc-730-v3.5 ◽

2002 ◽

Vol 730 ◽

Author(s):

Mohammad Afzaal ◽

David Crouch ◽

Paul O'Brien ◽

Jin-Ho Park

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Organic Chemical ◽

Metal Chalcogenides ◽

Single Source ◽

Glass Substrates ◽

Semiconductor Thin Films ◽

Metal Organic

AbstractThin films of CdS and CdSe have been deposited on glass substrates by low pressure metal-organic chemical vapour deposition (LP-MOCVD) using Cd[(EPiPr2)2N]2 (E = S, Se) as single-source precursors. These air-stable precursors are volatile, making them suitable for the deposition of thin films. As-deposited films were crystalline metal chalcogenides, as confirmed by X-ray powder diffraction (XRD), and their morphologies were studied by scanning electron microscopy (SEM).

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Preparation of Nickel Sulfide Thin Films and Nanocrystallites Using Nickel Furfuraldehyde Thiosemicarbazone as Single-Source Precursor

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.383-390.3828 ◽

2011 ◽

Vol 383-390 ◽

pp. 3828-3834 ◽

Cited By ~ 1

Author(s):

Ajay V. Gole ◽

Shivram S. Garje

Keyword(s):

Electron Microscopy ◽

Thin Films ◽

Growth Temperature ◽

Nickel Sulfide ◽

Hexagonal Phase ◽

Chemical Vapour ◽

X Rays ◽

Single Source ◽

Sem Images ◽

Single Source Precursor

Nickel furfuraldehyde thiosemcarbabazone adduct of the type, NiCl2(L)2(L = furfuraldehyde thiosemicarbazone) was synthesized by the reaction between nickel dichloride hexahydrate and furfuraldehyde thiosemicarbazone in 1:2 stoichiometry. The resulting compound was characterised by elemental analysis, IR,1H and13C{1H} NMR spectral data. It was further used as a single-source precursor for the deposition of nickel sulfide thin films by aerosol assisted chemical vapour deposition (AACVD) technique and the nickel sulfide nanocrystallites by pyrolysis and solvothermal decomposition methods. The thin films obtained were characterised by powder X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive analysis by X-rays (EDAX) and atomic force microscopy (AFM). The nanocrystallites obtained were also characterized by XRD, EDAX as well as transmission electron microscopy (TEM). The SEM images of the thin films show formation of different morphologies of nickel sulfide, i.e. nanoball-like, nanowires to flower-like depending on the growth temperature. The mechanism for the variation of the morphology with the growth temperature has been proposed. The XRD of the nanocrystallites obtained matches with the hexagonal phase of nickel sulfide and the TEM images show formation of 10-50 nm spherical nano-crystals.

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