Structural and Tribological Properties of Molybdenum Disulfide/Metal Multilayered Films Deposited by Pulsed Laser Deposition

2002 ◽  
Vol 750 ◽  
Author(s):  
A. R. Phani ◽  
J. E. Krzanowski ◽  
J. J. Nainaparampil
Keyword(s):  
Pulsed Laser Deposition ◽  
Tribological Properties ◽  
Friction And Wear ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Wear Testing ◽  
X Ray Diffraction ◽  
Wavelength Dispersive Spectroscopy ◽  
Multilayered Films ◽  
Mechanical And Tribological Properties

ABSTRACTThe structural, mechanical and tribological properties of MoS2/metal and MoS2/carbide multilayer thin films have been examined in this study. The films were deposited by pulsed laser deposition of sequential layers of MoS2 and either Ti, Cr or TiC. The compositions of the films were analyzed by wavelength dispersive spectroscopy (WDS) and confirmed the presence of the deposited elements. X-ray diffraction and cross-section SEM methods were employed to characterize the films. The XRD results did not reveal the presence of separate Ti, Cr or TiC phases, and the SEM did not show any multilayer structures. From these results, it was concluded that the added metal or carbide elements are present as either a dispersed nano-structured phase or in solid solution with the MoS2. Nonetheless, friction and wear testing showed dramatic improvements over MoS2 films when tested in a humid (45% r/h) environment.

Preparation and Tribological Properties of Amorphous Ti/C Multilayers by Pulsed Laser Deposition

2008 ◽  
Vol 47-50 ◽  
pp. 617-620
Author(s):  
C.F. Hong ◽  
J.P. Tu ◽  
R.L. Li ◽  
X.H. Zheng
Keyword(s):  
Pulsed Laser Deposition ◽  
Tribological Properties ◽  
Pulsed Laser ◽  
Tribological Performance ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Carbon Phase ◽  
X Ray ◽  
Low Wear ◽  
Scanning Electron

Amorphous Ti/C multilayers were prepared on titanium-alloy and silicon (100)-wafer substrates by pulsed laser deposition. Films with different Ti concentration were synthesized by changing the ablating time for Ti and C targets. The morphology and microstructure of Ti/C multilayers were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray diffraction (XRD). Both of the Ti and C monolayers were amorphous. The metallic Ti stimulated the formation of more amorphous carbon phase by reducing the sp2 aromatic bonds and elongating the C-C chain bonds. The tribological properties of Ti/C multilayers were investigated by ball-on-disk tribometer. The pure C film and the multilayers containing more than 68.8 at.% of Ti showed low wear resistance. The multilayer contained 36.8 at.% of Ti exhibited the lowest wear rate at 3.54×10–16 m3/N·m. The formation of carbon related interlayer and its effect on tribological performance of the films were discussed.

The Effects of Substrate Temperature and Bias on the Structural, Mechanical and Tribological Properties of TiC films deposited by Magnetron Assisted Pulsed Laser Deposition

2001 ◽  
Vol 697 ◽  
Author(s):  
A.R. Phani ◽  
J.E. Krzanowski ◽  
J.J. Nainaparampil
Keyword(s):  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Tribological Properties ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Indentation Hardness ◽  
Substrate Bias ◽  
X Ray ◽  
Mechanical And Tribological Properties

AbstractTitanium carbide films have been deposited using a hybrid magnetron sputtering/ pulsed laser deposition technique. One set of films was deposited at substrate temperatures ranging from room temperature to 600oC with no substrate bias, and a second set was deposited at 400°C bias voltages up to -150V. X-ray diffraction, X-ray photoelectron spectroscopy, and electron microscopy were employed for structural and compositional characterization of the films, and nano-indentation hardness testing and pin-on-disc wear tests were used to evaluate the mechanical and tribological properties. All the TiC films deposited without substrate bias were highly crystalline. The films deposited with bias had significantly reduced crystallinity and non-stoichiometric film compositions. The hardness of the TiC films increased with substrate temperature from 8 GPa at room temperature to 18 GPa at 600oC, whereas the biased films had a maximum hardness of 12 GPa. The wear test data showed significantly lower friction and longer wear life for the -150V biased film.

Microstructural and Electrical Characterization of Barium Strontium Titanatebased Solid Solution Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition

2002 ◽  
Vol 720 ◽  
Author(s):  
Costas G. Fountzoulas ◽  
Daniel M. Potrepka ◽  
Steven C. Tidrow
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Electrical Characterization ◽  
Field Variable ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Ceramic Substrates ◽  
Nominal Thickness

AbstractFerroelectrics are multicomponent materials with a wealth of interesting and useful properties, such as piezoelectricity. The dielectric constant of the BSTO ferroelectrics can be changed by applying an electric field. Variable dielectric constant results in a change in phase velocity in the device allowing it to be tuned in real time for a particular application. The microstructure of the film influences the electronic properties which in turn influences the performance of the film. Ba0.6Sr0.4Ti1-y(A 3+, B5+)yO3 thin films, of nominal thickness of 0.65 μm, were synthesized initially at substrate temperatures of 400°C, and subsequently annealed to 750°C, on LaAlO3 (100) substrates, previously coated with LaSrCoO conductive buffer layer, using the pulsed laser deposition technique. The microstructural and physical characteristics of the postannealed thin films have been studied using x-ray diffraction, scanning electron microscopy, and nano indentation and are reported. Results of capacitance measurements are used to obtain dielectric constant and tunability in the paraelectric (T>Tc) regime.

Study of Raman Spectrum of Fe Doped CeO2 Thin Films Grown by Pulsed Laser Deposition

2010 ◽  
Vol 123-125 ◽  
pp. 375-378 ◽  
Author(s):  
Ram Prakash ◽  
Shalendra Kumar ◽  
Chan Gyu Lee ◽  
S.K. Sharma ◽  
Marcelo Knobel ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Single Phase ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Fe Doping ◽  
Full Width ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
X Ray

Ce1-xFexO2 (x=0, 0.01, 0.03 and 0.0 5) thin films were grown by pulsed laser deposition technique on Si and LaAlO3 (LAO) substrates. These films were deposited in vacuum and 200 mTorr oxygen partial pressure for both the substrates. These films were characterized by x-ray diffraction XRD and Raman spectroscopy measurements. XRD results reveal that these films are single phase. Raman results show F2g mode at ~466 cm-1 and defect peak at 489 cm-1 for film that deposited on LAO substrates, full width at half maximum (FWHM) is increasing with Fe doping for films deposited on both the substrates.

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