Mixed-Cation Optical Thin Films from Tailored Composition Targets

1986 ◽  
Vol 77 ◽  
Author(s):  
J. F. Denatale ◽  
A. B. Harker
Keyword(s):  
Thin Films ◽  
Mixed Oxides ◽  
Ion Beam ◽  
Index Of Refraction ◽  
Gradient Index ◽  
Transformation Behavior ◽  
Beam Source ◽  
Optical Index ◽  
Microstructure Transformation ◽  
Convenient Means

ABSTRACTAmorphous optical thin films of mixed oxides have been fabricated whose composition and optical index of refraction have been varied in a controlled manner as a function of film thickness using a single ion beam source with tailored composition targets. The microstructure, transformation behavior, and stress in the films are being studied for the systems Al2O3-TiO2, TiO2-SiO2, and ZrO2-SiO2. The technique has been found to be a convenient means of producing gradient index optical structures.

Ion Effects in Optical Films

1991 ◽  
Vol 223 ◽  
Author(s):  
U. J. Gibson
Keyword(s):  
Thin Films ◽  
Ion Beams ◽  
Index Of Refraction ◽  
Gradient Index ◽  
Index Structures ◽  
Film Properties ◽  
Optical Films ◽  
Multilayer Filters ◽  
Ion Effects ◽  
Deposition Processes

ABSTRACTIon bombardment during growth of thin films has been shown to be a powerful technique for alteration of a wide variety of film properties from index of refraction and stoichiometry to density and abrasion resistance. A brief review of the deposition processes and ion effects of relevance to the production of optical films is presented. Application of the technique to some particular problems in films with both optical and protective roles, and the use of ion beams to alter the chemical composition and hence index of films will be discussed. Both homogeneous and spatially non-uniform coatings will be discussed, including generation of multilayer filters and gradient index structures in waveguiding films.

Properties of Silicon Oxynitride and Aluminum Oxynitride Coatings Deposited Using Ion Assisted Deposition

1988 ◽  
Vol 128 ◽  
Author(s):  
G. A. Al-Jumaily ◽  
T. A. Mooney ◽  
W. A. Spurgeon ◽  
H. M. Dauplaise
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Thermal Evaporation ◽  
Ion Beam ◽  
Silicon Oxynitride ◽  
Index Of Refraction ◽  
Environmental Stability ◽  
Gas Mixture ◽  
Aluminum Oxynitride ◽  
Oxynitride Coatings

ABSTRACTOptical thin films of nitrides, oxynitrides and oxides of aluminum and silicon were deposited using ion assisted deposition. Coatings were deposited by thermal evaporation of AlN and e-beam evaporation of Si with simultaneous bombardment with 300 eV ions of nitrogen, a mixture of nitrogen and oxygen or oxygen. The chemical composition and the index of refraction of the coating was varied by varying the gas mixture in the ion beam. Optical properties of and environmental stability of coatings were examined. Results indicated that coatings are stable even under severe conditions of humidity and temperature.

scholarly journals Substoichiometric zirconia thin films prepared by reactive sputtering of metallic zirconium using a direct current ion beam source

2019 ◽  
Vol 680 ◽  
pp. 52-60 ◽  
Author(s):  
Thomas Götsch ◽  
Benedict Neumann ◽  
Bernhard Klötzer ◽  
Simon Penner
Keyword(s):  
Thin Films ◽  
Direct Current ◽  
Ion Beam ◽  
Reactive Sputtering ◽  
Beam Source

Duoplasmatron Ion Beam Source for Vacuum Sputtering of Thin Films

1967 ◽  
Vol 38 (8) ◽  
pp. 1147-1151 ◽  
Author(s):  
K. L. Chopra ◽  
M. R. Randlett
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Beam Source

Anomalies in the Optical Index of Refraction of Spun Cast Polystyrene Thin Films

2000 ◽  
Vol 12 (4) ◽  
pp. 621-629 ◽  
Author(s):  
Xuesong Hu ◽  
Kwanwoo Shin ◽  
Miriam Rafailovich ◽  
Jonathan Sokolov ◽  
Richard Stein ◽  
...  
Keyword(s):  
Thin Films ◽  
Index Of Refraction ◽  
Optical Index

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Interferometric (Fourier-Spectroscopic) Measurement of Electron Energy Distributions

1990 ◽  
Vol 48 (2) ◽  
pp. 110-111 ◽  
Author(s):  
F. Hasselbach ◽  
A. Schäfer
Keyword(s):  
Group Velocity ◽  
Wave Packets ◽  
Index Of Refraction ◽  
Electron Wave ◽  
Fringe Contrast ◽  
Faraday Cage ◽  
Optical Index ◽  
Wien Filter ◽  
Coherent Wave ◽  
Electric And Magnetic Fields

Möllenstedt and Wohland proposed in 1980 two methods for measuring the coherence lengths of electron wave packets interferometrically by observing interference fringe contrast in dependence on the longitudinal shift of the wave packets. In both cases an electron beam is split by an electron optical biprism into two coherent wave packets, and subsequently both packets travel part of their way to the interference plane in regions of different electric potential, either in a Faraday cage (Fig. 1a) or in a Wien filter (crossed electric and magnetic fields, Fig. 1b). In the Faraday cage the phase and group velocity of the upper beam (Fig.1a) is retarded or accelerated according to the cage potential. In the Wien filter the group velocity of both beams varies with its excitation while the phase velocity remains unchanged. The phase of the electron wave is not affected at all in the compensated state of the Wien filter since the electron optical index of refraction in this state equals 1 inside and outside of the Wien filter.

Electron energy loss spectroscopy of diamond-like carbon thin films

1992 ◽  
Vol 50 (2) ◽  
pp. 1272-1273
Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Loss ◽  
Electron Energy ◽  
Ion Beam ◽  
Diamond Like Carbon ◽  
Ion Beam Deposition ◽  
Chemistry Research ◽  
Carbon Thin Films ◽  
Electron Energy Loss ◽  
Beam Deposition

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.

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