Evaluation of Ar-Diluted Silane PECVD for Thin Film Si:H Based Solar Cells

2004 ◽  
Vol 808 ◽  
Author(s):  
J. A. Anna Selvan ◽  
Yuan-Min Li ◽  
Liwei Li ◽  
Alan E. Delahoy
Keyword(s):  
Solar Cells ◽  
Spectral Response ◽  
Nanocrystalline Silicon ◽  
Thin Layers ◽  
Dilution Method ◽  
Critical Question ◽  
Long Wavelength ◽  
Hydrogen Dilution ◽  
Porous Microstructure ◽  
The Stability

ABSTRACTDilution by Ar of silane plasma has been reported to increase the stability of a-Si:H films. A critical question is whether Ar diluted i-layers offer higher stabilized solar cell efficiencies than the conventional hydrogen dilution method. We have fabricated a-Si:H p-i-n solar cells with RF-PECVD i-layers by Ar dilution of silane. Ar dilution ratio (ADR, Ar/SiH4), RF power,pressure, and i-layer thickness were varied. At low ADR < 20, such solar cells show comparable initial efficiencies and stability as those devices having H2-diluted i-layers of similar thickness. For cells made with ADR > 20, the initial efficiency decreases dramatically with further increase in Ar dilution, and light soaking causes only mild changes in efficiencies. The stabilized efficiencies of cells made with high ADR are inferior to the cells produced with low ADR or cells prepared by H2 dilution. Further, Voc of solar cells made with high ADR (> 50) decreases substantially in ambient, indicating a porous microstructure susceptible to oxidation. While thermal annealing improves the Voc, a full recovery of Voc is made by accelerated light soaking.The combination of high power and high ADR can lead to nanocrystalline silicon (nc-Si:H) growth, although nucleation is much more difficult to attain by the Ar dilution method compared to hydrogen dilution. We have succeeded in fabricating p-i-n solar cells with nc-Si:H i-layers prepared by the Ar dilution approach. The double dilution by Ar and hydrogen of silane (Ar+H2+SiH4) can result in nc-Si:H i-layers with enhanced long wavelength spectral response compared to devices incorporating nc-Si:H i-layers grown by H2 dilution only. The nc-Si:H solar cells with Ar+H2 diluted i-layers exhibit no light-induced degradation.Using energetic Ar-rich plasma, in a process much simpler than the traditional nc-Si:H technique, doped a-Si:H thin layers can be prepared to form excellent tunnel junctions for multi-junction solar cells. We demonstrate such a novel, non-contaminating tunnel junction in tandem a-Si/a-Si and a-Si/nc-Si solar cells entirely fabricated in a single-chamber RF-PECVD system.

Research on Nanocrystalline Silicon Film Solar Cells

2011 ◽  
Vol 347-353 ◽  
pp. 870-873
Author(s):  
Chun Rong Xue
Keyword(s):  
Grain Size ◽  
Solar Cells ◽  
Band Gap ◽  
Optical Band Gap ◽  
Volume Fraction ◽  
Silicon Film ◽  
Nanocrystalline Silicon ◽  
Processing Parameters ◽  
Crystalline Volume Fraction ◽  
Hydrogen Dilution

Nanocrystalline silicon film has become the research hit of today’ s P-V solar technology. It’s optical band gap was controlled through changing the grain size and crystalline volume fraction for the quanta dimension effect. The crystalline volume fraction in nc-Si:H is modulated by varying the hydrogen concentration in the silane plasma. Also, the crystallinity of the material increases with increasing hydrogen dilution ratio, the band tail energy width of the nc-Si:H concurrently decreases. Two sets of nc-Si:H solar cells were made with different layer thicknesss, their electronic and photonic bandgap, absorption coefficient, optical band gap, nanocrystalline grain size(D), and etc have been stuied. In addition, we discussed the relationship between the stress of nc-Si thin films and H2 ratio. At last nc-Si:H solar cells have been designed and prepared successfully in the optimized processing parameters.

Analysis of Defects and Surface Roughness on the Hydrogenated Amorphous Silicon (a-Si:H) Intrinsic Thin Film for Solar Cells

2019 ◽  
Vol 966 ◽  
pp. 398-403
Author(s):  
Yoyok Cahyono ◽  
Novita Dwi Purnamasari ◽  
Mochamad Zainuri ◽  
Suminar Pratapa ◽  
Darminto
Keyword(s):  
Thin Film ◽  
Surface Roughness ◽  
Solar Cells ◽  
Band Gap ◽  
Indium Tin Oxide ◽  
Energy Band ◽  
Thin Layers ◽  
Oxide Glass ◽  
Energy Band Gap ◽  
Hydrogen Dilution

Effect of defect - through observation of energy absorption Urbach, on deposition rate, energy band gap, and surface roughness of intrinsic thin film are investigated using Radio Frequency Plasma Enhance Chemical Vapor Deposition (RF-PECVD). Films are grown on ITO (Indium Tin Oxide) glass substrate. Analysis of energy band gap is conducted to determine changes in the structure of a thin film of a-Si:H. Energy band gap is important to determine the portion of the spectrum of sunlight that is absorbed solar cells. From the characterization using UV-Vis spectrometer and the Tauc’s plot method, the width of the resulting energy band gap is greater if the hydrogen dilution is increased. It can be shown that the increase of the hydrogen dilution, will increase the energy band gap, and the surface roughness of thin layers. Instead, the improvement of the hydrogen dilution decrease the rate of deposition and Urbach energy. It is estimated that with greater hydrogen dilution, an intrinsic thin film of a-Si:H is more conductive for more reduction in residual of band tail defects or dangling bond defects.

Thin-film Photodiode with an a-Si:H/nc-Si:H Absorption Bilayer

2011 ◽  
Vol 1321 ◽  
Author(s):  
Y. Vygranenko ◽  
M. Vieira ◽  
A. Sazonov
Keyword(s):  
Thin Film ◽  
Leakage Current ◽  
Near Infrared ◽  
Spectral Response ◽  
Nanocrystalline Silicon ◽  
Depletion Region ◽  
Long Wavelength ◽  
Near Ultraviolet ◽  
High Bias ◽  
Bias Range

ABSTRACTWe report on the fabrication and characterization of n+-n-i-δi-p thin-film photodiodes with an active region comprising a hydrogenated nanocrystalline silicon (nc-Si:H) n-layer and a hydrogenated amorphous silicon (a-Si:H) i-layer. The combination of wide- and narrow-gap absorption layers enables the spectral response extending from the near-ultraviolet (NUV) to the near-infrared (NIR) region. Moreover, in the low-bias range, when only the i-layer is depleted, the leakage current is significantly lower than that in the conventional nc-Si:H n+-n-p+ photodiode deposited under the same deposition conditions. Device with the 900nm/400nm thick n-i-layers exhibits a reverse dark current density of 3 nA/cm2 at −1V. In the high-bias range, when the depletion region expands within the n-layer, the magnitude of the leakage current depends on electronic properties of nc-Si:H. The density of shallow and deep states, and diffusion length of holes in the n-layer have been estimated from the capacitance-voltage characteristics and from the bias dependence of the long-wavelength response, respectively. To improve the quantum efficiency in the NIR-region, we have also implemented a Cr / ZnO:Al back reflector. The observed long-wavelength spectral response is about twice as high as that for a reference photodiode without ZnO:Al layer. Results demonstrate the feasibility of the photodiode for low-level light detection in the NUV-to-NIR spectral range.

Metastability in hydrogenated nanocrystalline silicon solar cells

2007 ◽  
Vol 22 (5) ◽  
pp. 1128-1137 ◽  
Author(s):  
Guozhen Yue ◽  
Baojie Yan ◽  
Gautam Ganguly ◽  
Jeffrey Yang ◽  
Subhendu Guha
Keyword(s):  
Solar Cells ◽  
Band Gap ◽  
Amorphous Phase ◽  
Reverse Bias ◽  
Volume Fraction ◽  
Nanocrystalline Silicon ◽  
Silicon Solar Cells ◽  
Single Junction ◽  
Hydrogen Dilution ◽  
Forward Current

Light-induced metastability in hydrogenated nanocrystalline silicon (nc-Si:H) single-junction solar cells was studied systematically. First, we observed no light-induced degradation when the photon energy was lower than the band gap of the amorphous phase; degradation occurred when the energy was higher than the band gap in the amorphous phase. The light-induced degradation could be annealed away at an elevated temperature. We concluded that the light-induced defect generation occurred mainly in the amorphous phase. Second, forward current injection did not degrade the nc-Si:H cell performance. However, a reverse bias during light soaking enhanced the degradation. Third, the nc-Si:H cells made with an optimized hydrogen dilution profile showed minimal degradation although these cells had a high amorphous volume fraction. This indicated that the amorphous volume fraction was not the only factor determining the degradation. Other factors also played important roles in the nc-Si:H stability.

Stability of Single and Tandem Junction A-Si:H Solar Cells Grown using the ECR Process

1997 ◽  
Vol 467 ◽  
Author(s):  
Vikram L. Dalal ◽  
Tim Maxson ◽  
Robert Girvan ◽  
Sohail Haroon
Keyword(s):  
Solar Cells ◽  
Stability Studies ◽  
Stability Tests ◽  
High Hydrogen ◽  
Single Junction ◽  
Hydrogen Dilution ◽  
The Stability

ABSTRACTWe report on the fabrication and stability tests of single junction a-Si:H, and tandem junction a-Si:H/a-Si:H solar cells using the ECR process under high hydrogen dilution (H-ECR process). We show that devices with high fill factors can be made using the H-ECR process. We also report on the stability studies of the solar cells under 1 and 2-sun illumination conditions. The solar cells show very little degradation even after 500 hours of illumination under 2 x sunlight illumination.

Amorphous Silicon Alloy Materials and Solar Cells Near the Threshold of Microcrystallinity

1999 ◽  
Vol 557 ◽  
Author(s):  
J. Yang ◽  
S. Guha
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Amorphous Silicon ◽  
Triple Junction ◽  
High Efficiency ◽  
Spectral Response ◽  
High Quality ◽  
Silicon Alloys ◽  
Solar Cell Performance ◽  
Hydrogen Dilution

AbstractOne of the most effective techniques used to obtain high quality amorphous silicon alloys is the use of hydrogen dilution during film growth. The resultant material exhibits a more ordered microstructure and gives rise to high efficiency solar cells. As the hydrogen dilution increases, however, a threshold is reached, beyond which microcrystallites begin to form rapidly. In this paper, we review some of the interesting features associated with the thin film materials obtained from various hydrogen dilutions. They include the observation of linear-like objects in the TEM micrograph, a shift of the principal Si TO band in the Raman spectrum, a sharp, low temperature peak in the H2 evolution spectrum, a shift of the wagging mode in the IR spectrum, and a narrowing of the Si (111) peak in the X-ray diffraction pattern. These spectroscopic tools have allowed us to optimize deposition conditions to near the threshold of microcrystallinity and obtain desired high quality materials. Incorporation of the improved materials into device configuration has significantly enhanced the solar cell performance. Using a spectral-splitting, triple-junction configuration, the spectral response of a typical high efficiency device spans from below 350 nm to beyond 950 nm with a peak quantum efficiency exceeding 90%; the triple stack generates a photocurrent of 27 mA/cm2. This paper describes the effect of the improved materials on various solar cell structures, including a 13% active-area, stable triple-junction device.

scholarly journals Optimization ofμc-Si1−xGex:H Single-Junction Solar Cells with Enhanced Spectral Response and Improved Film Quality

2015 ◽  
Vol 2015 ◽  
pp. 1-9
Author(s):  
Yen-Tang Huang ◽  
Pei-Ling Chen ◽  
Po-Wei Chen ◽  
Hung-Jung Hsu ◽  
Cheng-Hang Hsu ◽  
...  
Keyword(s):  
Solar Cells ◽  
Spectral Response ◽  
Rf Power ◽  
Single Junction ◽  
Long Wavelength ◽  
Tandem Cell ◽  
Cell Efficiency ◽  
Photo Conductivity ◽  
Gas Ratio ◽  
Incorporation Efficiency

Effects of RF power on optical, electrical, and structural properties ofμc-Si1−xGex:H films was reported. Raman and FTIR spectra fromμc-Si1−xGex:H films reflected the variation in microstructure and bonding configuration. Unlike increasing the germane concentration for Ge incorporation, low RF power enhanced Ge incorporation efficiency inμc-Si1−xGex:H alloy. By decreasing RF power from 100 to 50 W at a fixed reactant gas ratio, the optical bandgap ofμc-Si1−xGex:H was reduced owing to the increase in Ge content from 11.2 to 23.8 at.%, while Ge-related defects and amorphous phase were increased. Consequently, photo conductivity of 1.62 × 10−5 S/cm was obtained for theμc-Si1−xGex:H film deposited at 60 W. By applying 0.9 μm thickμc-Si1−xGex:H absorber withXCof 48% and [Ge] of 16.4 at.% in the single-junction cell, efficiency of 6.18% was obtained. The long-wavelength response ofμc-Si1−xGex:H cell was significantly enhanced compared with theμc-Si:H cell. In the case of tandem cells, 0.24 μm a-Si:H/0.9 μmμc-Si1−xGex:H tandem cell exhibited a comparable spectral response as 0.24 μm a-Si:H/1.4 μmμc-Si:H tandem cell and achieved an efficiency of 9.44%.

Investigation of Textured Back Reflectors for Microcrystalline Silicon Based Solar Cells

1999 ◽  
Vol 557 ◽  
Author(s):  
O. Kluth ◽  
O. Vetterl ◽  
R. Carius ◽  
F. Finger ◽  
S. Wieder ◽  
...  
Keyword(s):  
Solar Cells ◽  
Near Infrared ◽  
Spectral Response ◽  
Short Circuit ◽  
Chemical Vapour ◽  
Root Mean Square Roughness ◽  
Microcrystalline Silicon ◽  
Feature Size ◽  
Long Wavelength ◽  
Back Reflectors

AbstractMicrocrystalline silicon (μc-Si:H) solar cells require an effective light trapping in the near infrared (NIR) to enhance the long wavelength spectral response. For this purpose we investigated back reflectors based on texture-etched ZnO/Ag stacks prepared on glass substrates by magnetron sputtering. With decreasing sputter pressure the resulting surface texture of the glass/Ag/ZnO substrates after etching exhibits a larger feature size and root mean square roughness. The increase in feature size corresponds to an increase of diffuse reflectivity. Applied in microcrystalline solar cells prepared by VHF plasma enhanced chemical vapour deposition (PECVD), the reflectors showing the largest feature size (prepared at the lowest possible sputter pressure) yielded the highest long wavelength spectral response. The μc-Si n-i-p cells prepared on the latter back reflector exhibited efficiencies of 6.9 % (short circuit current density jsc= 18.8 mA/cm2) and 7.5 % (jsc=25 mA/cm2) for an i-layer thickness of 1 μm and 3.5 μm, respectively.

Preparation of Narrow-gap a-Si:H Solar Cells by VHF-PECVD Technique

2010 ◽  
Vol 1245 ◽  
Author(s):  
Do Yun Kim ◽  
Ihsanul Afdi Yunaz ◽  
Shunsuke Kasashima ◽  
Shinsuke Miyajima ◽  
Makoto Konagai
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Solar Cell ◽  
Spectral Response ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Short Circuit Current Density ◽  
Open Circuit ◽  
Hydrogen Flow ◽  
Long Wavelength

AbstractOptical, electrical and structural properties of silicon films depending on hydrogen flow rate (RH), substrate temperature (TS), and deposition pressure (PD) were investigated. By decreasing RH and increasing TS and PD, the optical band gap (Eopt) of silicon thin films drastically declined from 1.8 to 1.63 eV without a big deterioration in electrical properties. We employed all the investigated Si thin films for p-i-n structured solar cells as absorbers with i-layer thickness of 300 nm. From the measurement of solar cell performances, it was clearly observed that spectral response in long wavelength was enhanced as Eopt of absorber layers decreased. Using the solar cell whose Eopt of i-layer was 1.65 eV, the highest QE at long wavelength with the short circuit current density (Jsc) of 16.34 mA/cm2 was achieved, and open circuit voltage (Voc), fill factor (FF), and conversion efficiency (η) were 0.66 V, 0.57, and 6.13%, respectively.

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