Fabrication of a novel split-backgate transistor by in situ focused ion-beam lithography and molecular-beam epitaxial regrowth

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

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Independently contacted electron–hole gas heterostructures fabricated with focused ion beam doping during molecular beam epitaxial growth

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590986 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3226 ◽

Cited By ~ 10

Author(s):

S. Vijendran ◽

P. J. A. Sazio ◽

H. E. Beere ◽

G. A. C. Jones ◽

D. A. Ritchie ◽

...

Keyword(s):

Epitaxial Growth ◽

Molecular Beam ◽

Focused Ion Beam ◽

Ion Beam ◽

Electron Hole ◽

Molecular Beam Epitaxial ◽

Molecular Beam Epitaxial Growth

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3-D Patterned III-V Semiconductor Devices Using High Energy In-Situ Focused Ion Beam Lithography and MBE

Frontiers in Nanoscale Science of Micron/Submicron Devices ◽

10.1007/978-94-009-1778-1_3 ◽

1996 ◽

pp. 35-39

Author(s):

P. D. Rose ◽

E. H. Linfield ◽

G. A. C. Jones ◽

D. A. Ritchie

Keyword(s):

Focused Ion Beam ◽

Ion Beam ◽

Semiconductor Devices ◽

High Energy ◽

Ion Beam Lithography

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Selective area epitaxy of GaAs using very low energy Ga+ focused ion beam deposition combined with molecular beam epitaxial growth

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)01028-7 ◽

1997 ◽

Vol 175-176 ◽

pp. 398-403 ◽

Cited By ~ 7

Author(s):

H.E. Beere ◽

J.H. Thompson ◽

G.A.C. Jones ◽

D.A. Ritchie

Keyword(s):

Molecular Beam ◽

Focused Ion Beam ◽

Ion Beam ◽

Low Energy ◽

Selective Area Epitaxy ◽

Molecular Beam Epitaxial ◽

Ion Beam Deposition ◽

Selective Area ◽

Molecular Beam Epitaxial Growth ◽

Beam Deposition

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Vertical-cavity surface-emitting laser diodes fabricated by in situ dry etching and molecular beam epitaxial regrowth

IEEE Photonics Technology Letters ◽

10.1109/68.205613 ◽

1993 ◽

Vol 5 (3) ◽

pp. 284-287 ◽

Cited By ~ 19

Author(s):

K.D. Choquette ◽

M. Hong ◽

R.S. Freund ◽

J.P. Mannaerts ◽

R.C. Wetzel ◽

...

Keyword(s):

Molecular Beam ◽

Laser Diodes ◽

Dry Etching ◽

Cavity Surface ◽

Molecular Beam Epitaxial ◽

Epitaxial Regrowth ◽

Vertical Cavity Surface ◽

Surface Emitting Laser ◽

Vertical Cavity

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Focused Ion Beam Micro- and Nanoengineering

MRS Bulletin ◽

10.1557/mrs2007.65 ◽

2007 ◽

Vol 32 (5) ◽

pp. 417-423 ◽

Cited By ~ 75

Author(s):

Richard M. Langford ◽

Philipp M. Nellen ◽

Jacques Gierak ◽

Yongqi Fu

Keyword(s):

Ion Implantation ◽

Focused Ion Beam ◽

Ion Beam ◽

Ion Beam Lithography ◽

Processing Techniques

AbstractThis article discusses applications of focused ion beam micro- and nanofabrication. Emphasis is placed on illustrating the versatility of focused ion beam and dual-platform systems and how they complement conventional processing techniques. The article is divided into four parts: maskless milling, ion beam lithography, ion implantation, and techniques such as in situ micromanipulation.

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