Fabrication and Resonance Characteristics of PZT Cantilevers

2021 ◽  
Vol 23 (5) ◽  
pp. 255-260
Author(s):  
V.F. Lukichev ◽  
◽  
I.I. Amirov ◽  
I.V. Uvarov ◽  
Kamran Keshavarzdivkolaee ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Lead Zirconate Titanate ◽  
Sacrificial Layer ◽  
Lead Zirconate ◽  
Mems Devices ◽  
Zirconate Titanate ◽  
Mems Resonators ◽  
Chemical Solutions ◽  
Output Characteristics

Thin films of lead zirconate titanate Pb(Zr0,52Ti0,48)O3 (PZT) with thickness of 1.4 μm were prepared on Si/SiO2/TiO2/Pt substrates by chemical solutions deposition. Based on the obtained films, the structures of PZT cantilevers were formed, with a length from 500 to 1000 /um and wide from 100 to 500 μm. Platinum (100 nm) as the bottom and top electrode, has been deposited by magnetron sputtering. PZT cantilevers werereleased by etching the sacrificial layer in SF6. The resonance characteristics of the PZT cantilevers were determined by the light lever method using a special optical measuring stand. Output characteristics of the PZT cantilevers, can be used in MEMS devices, specially, in MEMS resonators.

scholarly journals Synthesis, Microstructure and Properties of Magnetron Sputtered Lead Zirconate Titanate (PZT) Thin Film Coatings

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 944
Author(s):  
Youcao Ma ◽  
Jian Song ◽  
Xubo Wang ◽  
Yue Liu ◽  
Jia Zhou
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Lead Zirconate Titanate ◽  
Lead Zirconate ◽  
Influential Factors ◽  
Mems Devices ◽  
Large Area ◽  
Pzt Thin Films ◽  
Synthesis Parameters ◽  
Zirconate Titanate

Compared to aluminum nitride (AlN) with simple stoichiometry, lead zirconate titanate thin films (PZT) are the other promising candidate in advanced micro-electro-mechanical system (MEMS) devices due to their excellent piezoelectric and dielectric properties. The fabrication of PZT thin films with a large area is challenging but in urgent demand. Therefore, it is necessary to establish the relationships between synthesis parameters and specific properties. Compared to sol-gel and pulsed laser deposition techniques, this review highlights a magnetron sputtering technique owing to its high feasibility and controllability. In this review, we survey the microstructural characteristics of PZT thin films, as well as synthesis parameters (such as substrate, deposition temperature, gas atmosphere, and annealing temperature, etc.) and functional proper-ties (such as dielectric, piezoelectric, and ferroelectric, etc). The dependence of these influential factors is particularly emphasized in this review, which could provide experimental guidance for researchers to acquire PZT thin films with expected properties by a magnetron sputtering technique.

Orientation Dependence of Strontium-doped Lead Zirconate Titanate (PSZT) Thin Films on RF Magnetron Sputtering Conditions

2006 ◽  
Vol 928 ◽  
Author(s):  
Sharath Sriram ◽  
Madhu Bhaskaran ◽  
Anthony Stephen Holland ◽  
Geoffrey K Reeves
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Cooling Rate ◽  
Lead Zirconate Titanate ◽  
Ferroelectric Properties ◽  
Rf Magnetron Sputtering ◽  
Lead Zirconate ◽  
Orientation Dependence ◽  
Grain Structure ◽  
Zirconate Titanate

ABSTRACTStudies on strontium-doped lead zirconate titanate (PSZT) have been reported for its high piezoelectric and ferroelectric properties. For PSZT to exhibit pronounced piezoelectric behaviour it must have a crystalline grain structure (perovskite orientation). This paper is a study of the deposition of PSZT thin films by RF magnetron sputtering and the effect of cooling rate, after deposition at temperatures between 500 °C and 700 °C. X-Ray Diffraction (XRD) results are used to show how a cooling rate of 5 °C/min increases the degree of perovskite orientation in sputtered films, when compared to a cooling rate of 15 °C/min. The absence of significant shifts in the positions of diffraction peak patterns in XRD results are used to demonstrate low stress in the deposited films. Atomic Force Microscope (AFM) imaging is used to show the crystalline nature of the PSZT thin films.

Preparation of Lead Zirconate Titanate Thin Film Using Magnetron Sputtering

2012 ◽  
Vol 538-541 ◽  
pp. 162-165
Author(s):  
Li Yang Yu ◽  
Yang Wang ◽  
Guo Hua Yao
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Lead Zirconate Titanate ◽  
Energy Dispersive Spectrometer ◽  
Lead Zirconate ◽  
Gas Content ◽  
Crystalline Quality ◽  
Oxide Content ◽  
Zirconate Titanate

PZT(lead zirconate titanate) piezoelectric thin films were deposited on the glass substrates by RF (radio frequency) magnetron sputtering reaction method. The XRD(X-ray diffraction) analysis is used to characterize the structure of thin film, the pattern of EDS(energy dispersive spectrometer) shows the composition of thin film, and SEM(Scanning Electron Microscopy) is used to study the morphologies of thin films. The influence of different sputter gas content on the crystalline quality and the surface morphology are also investigated. The results demonstrate that volatile of lead oxide is closed to the ratio with the oxide content. The roughness of the thin film is influenced by the crystalline quality.

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