A NOVEL DISPOSABLE CULTURE VESSEL MADE OF FLUOROCARBON POLYMER FILMS FOR MICROPROPAGATION

1988 ◽  
pp. 663-670 ◽  
Author(s):  
M. Tanaka ◽  
M. Goi ◽  
T. Higashiura
Keyword(s):  
Polymer Films ◽  
Culture Vessel ◽  
Fluorocarbon Polymer

Preparation and UV Absorption Property of Hybrid Fluorocarbon/ZnO Thin Films Deposited by RF Magnetron Sputtering

2010 ◽  
Vol 143-144 ◽  
pp. 792-796 ◽  
Author(s):  
Yu Hui Zhang ◽  
Quan Ji ◽  
Zeng Ji Liu
Keyword(s):  
Magnetron Sputtering ◽  
Polymer Films ◽  
Rf Magnetron Sputtering ◽  
Uv Absorption ◽  
Hybrid Films ◽  
Fluorocarbon Films ◽  
Poly Ethylene Terephthalate ◽  
Fluorocarbon Polymer ◽  
Poly Ethylene ◽  
The Individual

Nanowire-mesoporous network structured fluorocarbon polymer films were prepared by radio-frequency (RF) magnetron sputtering of a polytetrafluoroethylene (PTFE) target on a poly(ethylene terephthalate) (PET) substrate. The fluorocarbon films were used as precursor materials to prepare fluorocarbon/ZnO double-layered hybrid films by reaction sputtering of a Zn target on the fluorocarbon films. The hybrid films had strong UV absorption that was far larger than the sum of the individual absorptions of fluorocarbon film and ZnO film because of a synergistic effect. The hybrid films exhibited multi-enhanced ultraviolet absorption due to the π-conjugated molecular structure, the nanoparticle-mesoporous reflection of fluorocarbon polymer films, and the absorption effect of nanosized ZnO particles.

Structural development and electronic properties of hot filament low pressure chemical vapor deposited fluorocarbon polymer films

2006 ◽  
Vol 21 (1) ◽  
pp. 242-254 ◽  
Author(s):  
A.C. Rastogi ◽  
S.B. Desu
Keyword(s):  
Polymer Films ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chain Structure ◽  
Leakage Currents ◽  
Filament Temperature ◽  
Pressure Chemical ◽  
Fluorocarbon Polymer ◽  
Hot Filament ◽  
Substrate Temperatures

Fluorocarbon polymer films in the poly(tetrafluoroethylene) (PTFE)-like structure are formed by a low-pressure chemical vapor deposition technique using the hot filament excitation of the gaseous C3F6O precursor. The filament and substrate temperatures were found to influence the structure of the deposited films. Infrared absorption and electron spectroscopy studies reveal that a PTFE-like (CF2)2n linear molecular chain structure evolves by an adsorption driven nucleation and CF2 polymerization process in the films deposited with low (450 °C) filament and high (70 °C) substrate temperatures. The films formed at a low substrate temperature (–165 °C) show a higher concentration of CF and C–CF bond defects and shorter (CF2)2n chains. A high (8–10 at.%) oxygen concentration in the films deposited at 600 °C filament temperature is attributed to the reaction of the (CF2)2n chains with COF and peroxyradicals arising from the dissociation of CF3C(O)F and affects the thermal stability of the films. Such reactions are not involved in the film growth at a low (450 °C) filament temperature. These films have much lower (<2 at.%) bonded oxygen content. The films having an ordered (CF2)2n chain structure formed at 70 °C are characterized by low leakage currents ∼7 × 10−11 A cm−2 at 0.1 MV cm−1 field. In comparison, high leakage currents ∼1 × 10−8 A cm−2 are observed for the films having a higher concentration of C–F and C–CF bonds.

Adhesion studies of metals on fluorocarbon polymer films

1990 ◽  
Vol 8 (4) ◽  
pp. 3304-3309 ◽  
Author(s):  
Chin‐An Chang ◽  
Yong‐Kil Kim ◽  
A. G. Schrott
Keyword(s):  
Polymer Films ◽  
Fluorocarbon Polymer

Durability of nitrided fluorocarbon polymer films for nanoimprint lithography

2011 ◽  
Vol 519 (16) ◽  
pp. 5490-5493 ◽  
Author(s):  
Han-Hyoung Kim ◽  
Se-Geun Park ◽  
El-Hang Lee ◽  
Seung-Gol Lee ◽  
Beom-Hoan O
Keyword(s):  
Polymer Films ◽  
Nanoimprint Lithography ◽  
Fluorocarbon Polymer
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