scholarly journals Study of the Morphological Features of the Cells of the Bacteria Yersinia pestis, Grown at Different Temperatures by Atomic Force Microscopy

Author(s):  
Denis V. Utkin ◽  
◽  
Elena G. Bulgakova ◽  
Pavel S. Erokhin ◽  
Oleg S. Kuznetsov ◽  
...  
Author(s):  
Yue-Rong Li ◽  
Gavin Pereira ◽  
Masoud Kasrai ◽  
Peter R. Norton

Antiwear (AW) films, generated from a mineral base oil containing zinc dialkyl dithiophosphate (ZDDP) additive, were extensively studied. These films were formed at various conditions such as different temperatures, various loads and rubbing times. The surface morphology of these films was investigated using atomic force microscopy (AFM) and the surface roughness of these films has been calculated from the images. X-ray absorption near edge structure (XANES) spectroscopy has been used to characterize the chemistry of these films. The intensity of phosphorus K-edge was also used to monitor the thickness of these films. Phosphorus L-edge spectra show that these films have slightly variable chemical natures. 31P Nuclear magnetic resonance (31P NMR) was used to study the ZDDP components in the residue oils. The spectra show that the primary and secondary ZDDP decompose quite differently at the various conditions. Tribological characteristics of these AW films were probed by measuring the coefficients of friction and the wear scar width of the counter faces.


2020 ◽  
pp. 41-56
Author(s):  
I. A. Makarova ◽  
A. V. Filonovich ◽  
V.N. Gadalov ◽  
E.A. Filatov

The paper presents the results of the research on the formation of nanocomposite fluoroplastic thin-wall coatings on substrates: 45 steel; copper and Al, formed under various conditions using the method of atomic force microscopy. Morphological features of the nanophase thin-layer fluoroplastic coatings with disperse nanoparticles have been studied. A model for the formation of nanophase composite systems is proposed.


1996 ◽  
Vol 449 ◽  
Author(s):  
M. J. Suscavage ◽  
D. F. Ryder ◽  
P. W. Yip

ABSTRACTThe effects of both temperature and atmosphere on the resulting morphological features of the polar faces of single crystal ZnO were investigated and characterized by atomic force microscopy (AFM). In studies where ZnO was thermally processed in flowing oxygen at atmospheric conditions within the temperature range of 500°C to 900°C for 30 minutes, the Znsurface (i.e., (000 1)) showed a tendency to reconstruct with increasing temperature until terraces became evident at 900°C. Terrace heights were as small as 0.9 nm. In contrast, the O-surface (i.e., (000 ī)) was observe to change very little during the O2-atmoshere, thermal treatment and remained comparatively rougher than the Zn-surface. ZnO samples which were thermally processed under high vacuum (i.e., 5 × 10-7 Torr) conditions exhibited a more dramatic contrast. The vacuum annealed Zn-surface was observed to develop very smooth surface features (Roughness = 0.09 nm) at annealing temperatures within the 700 – 800°C range. In contrast, and as expected, the O-surface roughness increased due to surface reduction reactions. In addition to these findings, it is noted that AFM measurements may be utilized as a convenient method to distinguish between the two polar surfaces of ZnO.Aluminum nitride was deposited on the Zn- and O- surfaces from 700 to 850°C by pulsed laser evaporation. X-ray diffraction indicated that the AIN was c-axis oriented with no interface reaction products detected between the ZnO substrate and AIN film.


2016 ◽  
Vol 24 (7) ◽  
pp. 847-854
Author(s):  
Yu Wang ◽  
◽  
Huiyong Zhang ◽  
Peng Xiang ◽  
Youyin Ye ◽  
...  

1996 ◽  
Vol 441 ◽  
Author(s):  
Hsieh-Li Chan ◽  
Ashok Kumar ◽  
L. Sanderson ◽  
J. J. Weimer

AbstractAluminum nitride (AIN), silicon nitride (Si3N4), and silicon carbide (SIC) thin films have been snthesized using pulsed laser deposition (PLD) techniques. AIN and Si3N4 films were deposited on Si (100) substrates at different temperatures (room temperature to 600°C) and partial pressures (15 mTorr N2 to 200 mTorr N2). SiC films were deposited on Si (100) substrates at different temperatures (room temperature to 400°C) in high vacuum. The atomic force microscopy (AFM) is a useful tool for studying the surface topography of these technologically interesting thin film surfaces. This paper discusses in detail AFM analysis of thin film coatings.


2005 ◽  
Vol 867 ◽  
Author(s):  
Subrahmanya Mudhivarthi ◽  
Parshuram Zantyea ◽  
Ashok Kumara ◽  
Jeung-Yeop Shim

AbstractChemical Mechanical Planarization (CMP) is the process of choice for planarization of the constituent layers of the Multi Level Metallization schemes in modern Integrated Circuits. Besides having a lot of advantages, copper CMP process still needs significant process control to eliminate defects such as delamination, microscratches, dishing, erosion etc. In this research, effect of heat generated at the interface on the generation of CMP defects has been investigated. CMP of blanket and patterned samples has been carried out at two conditions of pressure x velocity values with varying slurry temperature. Post CMP metrology is carried out using Atomic force microscopy (AFM) in order to characterize the variation in scratch depth, dishing profile and non-uniformity in step coverage. Pictures of the patterned samples polished at different temperatures are captured using Optical Microscopy (OM) to study the dishing and dissolution of copper lines in greater detail. The primary goal of this study was to gain deeper understanding of the effect of heat generation and rise in temperature at the pad-wafer-slurry interface on CMP induced defectivity.


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