Applying Optical Swanepoels Model to Assess the Effect of UV-Irradiated Time on Optical Properties of ZnSe Thick Film

The radiative transfer between two infinite parallel metallic surfaces separated by a nonconducting ideal dielectric is calculated on the basis of electromagnetic wave theory. The solution is restricted to the case of large spacing (thick film) wherein the effects of interference and radiation tunneling can be neglected. The optical properties of the metals are predicted via the anomalous skin effect theory, the Drude single electron theory and the Hagen-Rubens relation. A comparison of the predicted radiative fluxes indicates the large disparities which result from the three different specifications of the optical properties of metals. For practical applications at cryogenic temperatures, approximations are obtained for the thick film solution using the anomalous skin effect theory of the optical properties.

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Some optical properties of melanin thick film

Materials Today Proceedings ◽

10.1016/j.matpr.2019.06.688 ◽

2019 ◽

Vol 18 ◽

pp. 1972-1977 ◽

Cited By ~ 1

Author(s):

Ü. Akın ◽

İ. Çelik ◽

Ç. Avcı ◽

N. Tuğluoğlu ◽

Ö.F. Yüksel

Keyword(s):

Optical Properties ◽

Thick Film

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Electro-Optical Properties of Combined Dielectric Layers with BaTiO3 Thin Films Sputtered on BaTiO3 Thick Film

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2016.13579 ◽

2016 ◽

Vol 16 (11) ◽

pp. 11712-11714

Author(s):

Dong Hun Kim ◽

Jihyeong Ryu ◽

Minjae Han ◽

Hyungchul Lim ◽

Sang Heon Lee ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Thick Film ◽

Dielectric Layers

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Design of objective lens for 200-kV high-resolution electron microscopes

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100075361 ◽

1983 ◽

Vol 41 ◽

pp. 314-315

Author(s):

K. Tsuno ◽

T. Honda ◽

Y. Harada ◽

M. Naruse

Keyword(s):

Optical Properties ◽

Computer Technology ◽

Axial Magnetic Field ◽

Chromatic Aberration ◽

Objective Lens ◽

Resolution Electron ◽

Correction Of Astigmatism ◽

Three Stages ◽

Electron Microscopes ◽

Stage 1

Developement of computer technology provides much improvements on electron microscopy, such as simulation of images, reconstruction of images and automatic controll of microscopes (auto-focussing and auto-correction of astigmatism) and design of electron microscope lenses by using a finite element method (FEM). In this investigation, procedures for simulating the optical properties of objective lenses of HREM and the characteristics of the new lens for HREM at 200 kV are described.The process for designing the objective lens is divided into three stages. Stage 1 is the process for estimating the optical properties of the lens. Firstly, calculation by FEM is made for simulating the axial magnetic field distributions Bzc of the lens. Secondly, electron ray trajectory is numerically calculated by using Bzc. And lastly, using Bzc and ray trajectory, spherical and chromatic aberration coefficients Cs and Cc are numerically calculated. Above calculations are repeated by changing the shape of lens until! to find an optimum aberration coefficients.

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Optical Properties of HVEM Accelerators

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100114529 ◽

1975 ◽

Vol 33 ◽

pp. 180-181

Author(s):

A. Strojnik ◽

J.W. Scholl ◽

V. Bevc

Keyword(s):

Optical Properties ◽

Electron Accelerator ◽

Systematic Investigation ◽

Electron Source ◽

High Brightness ◽

The Past ◽

Wide Range ◽

Optical Behavior

The electron accelerator, as inserted between the electron source (injector) and the imaging column of the HVEM, is usually a strong lens and should be optimized in order to ensure high brightness over a wide range of accelerating voltages and illuminating conditions. This is especially true in the case of the STEM where the brightness directly determines the highest resolution attainable. In the past, the optical behavior of accelerators was usually determined for a particular configuration. During the development of the accelerator for the Arizona 1 MEV STEM, systematic investigation was made of the major optical properties for a variety of electrode configurations, number of stages N, accelerating voltages, 1 and 10 MEV, and a range of injection voltages ϕ0 = 1, 3, 10, 30, 100, 300 kV).

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Differential polarization imaging of sickled cells

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100102390 ◽

1988 ◽

Vol 46 ◽

pp. 62-63

Author(s):

Marcos F. Maestre

Keyword(s):

Optical Properties ◽

Theoretical Approach ◽

Polarized Light ◽

Polarization Microscopy ◽

Spectroscopic Techniques ◽

Polarization Imaging ◽

Circularly Polarized Light ◽

Circularly Polarized ◽

Microscopic Scale ◽

Chiral Structures

Recently we have developed a form of polarization microscopy that forms images using optical properties that have previously been limited to macroscopic samples. This has given us a new window into the distribution of structure on a microscopic scale. We have coined the name differential polarization microscopy to identify the images obtained that are due to certain polarization dependent effects. Differential polarization microscopy has its origins in various spectroscopic techniques that have been used to study longer range structures in solution as well as solids. The differential scattering of circularly polarized light has been shown to be dependent on the long range chiral order, both theoretically and experimentally. The same theoretical approach was used to show that images due to differential scattering of circularly polarized light will give images dependent on chiral structures. With large helices (greater than the wavelength of light) the pitch and radius of the helix could be measured directly from these images.

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Scanning Electron Microscopy in Hybrid Microelectronics

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100092244 ◽

1976 ◽

Vol 34 ◽

pp. 456-457

Author(s):

S. Khadpe ◽

R. Faryniak

Keyword(s):

Integrated Circuits ◽

Thick Film ◽

Integrated Circuit ◽

Failure Modes ◽

Three Dimensional ◽

Circuit Components ◽

Hybrid Microcircuit ◽

Electrical Connections ◽

Scanning Electron

The Scanning Electron Microscope (SEM) is an important tool in Thick Film Hybrid Microcircuits Manufacturing because of its large depth of focus and three dimensional capability. This paper discusses some of the important areas in which the SEM is used to monitor process control and component failure modes during the various stages of manufacture of a typical hybrid microcircuit.Figure 1 shows a thick film hybrid microcircuit used in a Motorola Paging Receiver. The circuit consists of thick film resistors and conductors screened and fired on a ceramic (aluminum oxide) substrate. Two integrated circuit dice are bonded to the conductors by means of conductive epoxy and electrical connections from each integrated circuit to the substrate are made by ultrasonically bonding 1 mil aluminum wires from the die pads to appropriate conductor pads on the substrate. In addition to the integrated circuits and the resistors, the circuit includes seven chip capacitors soldered onto the substrate. Some of the important considerations involved in the selection and reliability aspects of the hybrid circuit components are: (a) the quality of the substrate; (b) the surface structure of the thick film conductors; (c) the metallization characteristics of the integrated circuit; and (d) the quality of the wire bond interconnections.

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