scholarly journals Numerical Simulations of Carrier-selective Contact Silicon Solar Cells: Role of Surface Passivation and Carrier-Selective Layers Electronic Properties

Author(s):  
KRISHNA SINGH ◽  
Dipak Kumar Singh ◽  
Vamsi K. Komarala

Abstract Ag/ITO/MoOx/n-Si/LiFx/Al carrier-selective contact (CSC) solar cell structures are modelled and numerically simulated based on the experimental data using an industrial quality base silicon wafer by the Sentaurus TCAD software. The role of (1) electron-selective lithium fluoride (LiFx) layer and its thickness, (2) hole-selective molybdenum oxide (MoOx) work function variation, and (3) front contact (MoOx/n-Si) surface passivation interlayer are explored on the device performance. The electron-selective LiFx layer at the rear side is led to the strong enhancement in device photocurrent by providing the electrical barrier to the minority carriers (holes) and slight improvement in open-circuit voltage, but the thickness of the layer is sensitive to efficient extraction of the majority carriers (electrons). The hole-selective MoOx layer work function needs to engineer for inducing the strong inversion layer with better built-in potential at the MoOx/n-Si junction to achieve high open-circuit voltage from a cell. A thin SiOx interlayer at the MoOx/n-Si junction has enhanced the device open-circuit voltage significantly by minimizing the minority carrier recombination at the interface.

2011 ◽  
Vol 50 (6) ◽  
pp. 06GF08 ◽  
Author(s):  
Shyam S. Pandey ◽  
Kyung-Young Lee ◽  
Azwar Hayat ◽  
Yuhei Ogomi ◽  
Shuzi Hayase

2019 ◽  
Vol 216 ◽  
pp. 236-251 ◽  
Author(s):  
Débora P. Mroczek ◽  
Vladimir Lankevich ◽  
Eric R. Bittner

In this paper, we discuss our recent efforts to correlate the role of density of states, entropy, and configurational and energetic disorder to the open-circuit voltage, VOC, of model type-II organic polymer photovoltaics.


1994 ◽  
Vol 64 (2) ◽  
pp. 199-201 ◽  
Author(s):  
J. Zhao ◽  
A. Wang ◽  
A. Aberle ◽  
S. R. Wenham ◽  
M. A. Green

2017 ◽  
Vol 9 (39) ◽  
pp. 34131-34138 ◽  
Author(s):  
Aurélien Tournebize ◽  
Giorgio Mattana ◽  
Thérèse Gorisse ◽  
Antoine Bousquet ◽  
Guillaume Wantz ◽  
...  

2013 ◽  
Vol 205-206 ◽  
pp. 128-135 ◽  
Author(s):  
Andrew Findlay ◽  
Jacek Lagowski ◽  
Marshall Wilson ◽  
John D'Amico ◽  
Alexandre Savtchouk ◽  
...  

Recently introduced techniques for whole wafer mapping and imaging create new possibilities for root cause analysis of emitter passivation defects. Inline compatible PL imaging identifies such defects as localized regions with increased emitter saturation current and reduced implied open circuit voltage. Advanced offline evaluation of defective areas can be then performed with multiparameter noncontact measurements capable to establish the role of surface recombination, the interface trap density, or the dielectric charge that controls the field-effect passivation. The relevant novel metrologies are discussed and are illustrated using examples of advanced silicon passivation by dielectric films and by a-Si heterojunction structures.


1998 ◽  
Vol 507 ◽  
Author(s):  
Frank Siebke ◽  
Shigeo Yata ◽  
Yoshihiro Hishikawa ◽  
Makoto Tanaka

ABSTRACTWe investigated p-i-n solar cells with microcrystalline absorber but amorphous contact layers. Fill factor and open circuit voltage depend sensitively on the p/i interface. Using an optimized design of the p/i interface, cells with fill factors up to 65% and open circuit voltages of 0.45 V were deposited on amorphous p-layers. They are comparable to cells on micro- crystalline p-layers. A further increase of the open circuit voltage was achieved by variation of the p/i interface treatment but up to now it was accompanied by a decrease of the fill factor. We attribute this effect to a thin undoped amorphous layer at the p/i interface. Under non-optimized deposition conditions an amorphous instead of a microcrystalline silicon layer is grown at the p/i interface which can be detected by Raman measurements on cell structures. While the proper design of the p/i interface is crucial for the cell performance we did not observe significant differences between cells with amorphous and microcrystalline n-layers. The results reveal that the open circuit voltage is limited by the bulk properties of the undoped microcrystalline silicon.


Sign in / Sign up

Export Citation Format

Share Document