Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

scholarly journals ALD/MLD fabrication of luminescent Eu-organic hybrid thin films using different aromatic carboxylic acid components with N and O donors

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carboxylic Acid ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Aromatic Carboxylic Acid ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

An organic-inorganic hybrid semiconductor for flexible thin film transistor using molecular layer deposition

2021 ◽  
Author(s):  
Seung-Hwan Lee ◽  
Hyun-Jun Jeong ◽  
Ki-Lim Han ◽  
GeonHo Beak ◽  
Jin-Seong Park
Keyword(s):  
Thin Film ◽  
Indium Oxide ◽  
Molecular Layer ◽  
Thin Film Transistor ◽  
Hybrid Films ◽  
Molecular Layer Deposition ◽  
Inorganic Hybrid ◽  
Layer Deposition

Indium oxide and indicone hybrid films consisting of indium oxide and organic aromatic linker are grown by molecular layer deposition (MLD) using bis(trimethylsilyl)amido-diethyl Indium (INCA-1) as the indium precursor, hydrogen...

Synthesis, structure and properties of volatile lanthanide complexes containing amidinate ligands: application for Er2O3 thin film growth by atomic layer deposition

2005 ◽  
Vol 15 (39) ◽  
pp. 4224 ◽  
Author(s):  
Jani Päiväsaari ◽  
Charles L. Dezelah, IV ◽  
Dwayne Back ◽  
Hani M. El-Kaderi ◽  
Mary Jane Heeg ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Lanthanide Complexes ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Structure And Properties ◽  
Layer Deposition

scholarly journals Atomic/molecular layer deposition and electrochemical performance of dilithium 2-aminoterephthalate

2020 ◽  
Vol 49 (5) ◽  
pp. 1591-1599 ◽  
Author(s):  
Juho Heiska ◽  
Mikko Nisula ◽  
Eeva-Leena Rautama ◽  
Antti J. Karttunen ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Electrochemical Performance ◽  
Redox Potential ◽  
Molecular Layer ◽  
Amino Group ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Thin Film Electrodes

Crystalline Li-terephthalate and amino-functionalized Li-terephthalate thin film electrodes are fabricated from gaseous precursors with ALD/MLD to show that the electron-donating amino group lowers the redox potential.

Surfactant-Mediated Epitaxial Growth of Metallic Thin Films

2010 ◽  
Vol 117 ◽  
pp. 55-61
Author(s):  
Masao Kamiko ◽  
Ryoichi Yamamoto
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Epitaxial Growth ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Metallic Thin Films ◽  
Layer By Layer ◽  
Metallic Films ◽  
Heteroepitaxial Growth

The effects of several surfactants on the homoepitaxial and heteroepitaxial growth of metallic films and multilayers have been studied and compared. Our measurements clearly revealed that pre-deposition of a small amount of surfactant prior to the adatom deposition changed thin film growth mode and structure. The pre-deposited surfactant enhanced layer-by-layer (LBL) growth of the homoepitaxial and heteroepitaxial growth of metallic films. The surfactant also enhanced the epitaxial growth of metallic multilayer.

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