scholarly journals Импульсное лазерное облучение светоизлучающих структур со слоем (Ga,Mn)As

2021 ◽  
Vol 63 (9) ◽  
pp. 1245
Author(s):  
Б.Н. Звонков ◽  
О.В. Вихрова ◽  
Ю.А. Данилов ◽  
П.Б. Демина ◽  
М.В. Дорохин ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Laser Annealing ◽  
Secondary Ion Mass Spectrometry ◽  
Pulsed Laser ◽  
Radiation Energy ◽  
Original Data ◽  
Heat Propagation ◽  
Frequency Separation ◽  
Hall Resistance ◽  
Radiation Energy Density

InGaAs/GaAs heteronanostructures with a (Ga,Mn)As layer on the surface were fabricated by MOCVD epitaxy and pulsed laser deposition, and the effect of a pulsed excimer laser (wavelength 248 nm, pulse duration ~ 30 ns) on their radiative, structural and galvanomagnetic properties was studied. The radiation energy density was varied in the range from 200 to 360 mJ/cm2. In the studies, photoluminescence spectroscopy was used, which makes it possible to analyze the polarization characteristics of the radiation of the structures. The crystalline perfection of the initial and laser-irradiated samples was studied using Raman spectroscopy. The elemental composition of the structures and its depth distribution were studied by secondary ion mass spectrometry. The effect of pulsed laser annealing on the ferromagnetic properties of heteronanostructures was characterized by the behavior of the magnetic field dependences of the Hall resistance and magnetoresistance at temperatures of 10–300 K in the range of magnetic fields ± 3600 Oe. At room temperature, the study was carried out in magnetic fields reaching values of ± 28000 Oe. To obtain the calculated temperature distributions along the sample thickness and in time using a model of the laser annealing process based on solving the problem of heat propagation in a one-dimensional GaAs system taking into account the (Ga,Mn)As layer on the surface, we used the original data on the thermal conductivity coefficient of structures with a layer (Ga,Mn)As obtained using a modified frequency separation technique (3ω-method).

scholarly journals Воздействие импульсов эксимерного лазера на светоизлучающие InGaAs/GaAs-структуры с (Ga, Mn)As-слоем

2021 ◽  
Vol 63 (3) ◽  
pp. 346
Author(s):  
О.В. Вихрова ◽  
Ю.А. Данилов ◽  
Б.Н. Звонков ◽  
И.Л. Калентьева ◽  
Ю.М. Кузнецов ◽  
...  
Keyword(s):  
Energy Density ◽  
Quantum Well ◽  
Quantum Wells ◽  
Laser Annealing ◽  
Laser Energy ◽  
Laser Action ◽  
Pulsed Laser ◽  
Indium Content ◽  
Heat Propagation ◽  
Radiative Properties

It was studied the possibility of laser annealing modification of the properties of the (Ga,Mn)As layer located on the surface of a quantum-well InGaAs/GaAs structure, while retaining its radiative properties. The structures with four InGaAs/GaAs quantum wells (indium content was varied from 0.08 to 0.25), located at different distances from the (Ga,Mn)As layer, were fabricated by combining the methods of MOCVD-hydride epitaxy and pulsed laser deposition. The LPX-200 excimer laser pulse energy density was varied from 200 to 360 mJ/cm2, and the depth of laser action was determined from the change in the photoluminescence spectra of the quantum wells. In describing the results obtained, a model of the laser annealing process was used, based on solving the problem of heat propagation in a one-dimensional GaAs system, taking into account the (Ga,Mn)As layer on the surface. Changes in the structural and galvanomagnetic properties of the samples as a result of laser irradiation were analyzed. It is shown that as a result of pulsed laser action at a laser energy density range of 250 - 300 mJ/cm2, it is possible to preserve the emissive properties of the active region (InGaAs/GaAs quantum well) located at a distance of 10 - 12 nm from the (Ga,Mn)As layer and modify ferromagnetic properties of the semiconductor (Ga,Mn)As, namely: to increase the temperature of the ferromagnet-paramagnetic phase transition to values of at least 120 K. The results obtained are promising for the development of technology for devices of spin optoelectronics.

Pulsed laser annealing of zinc implanted GaAs

1978 ◽  
Vol 14 (4) ◽  
pp. 85 ◽  
Author(s):  
S.S. Kular ◽  
B.J. Sealy ◽  
K.G. Stephens ◽  
D.R. Chick ◽  
Q.V. Davis ◽  
...  
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Pulsed Laser Annealing

scholarly journals The Al Doping Effect on Epitaxial (In,Mn)As Dilute Magnetic Semiconductors Prepared by Ion Implantation and Pulsed Laser Melting

Materials ◽  
2021 ◽  
Vol 14 (15) ◽  
pp. 4138
Author(s):  
Ye Yuan ◽  
Yufang Xie ◽  
Ning Yuan ◽  
Mao Wang ◽  
René Heller ◽  
...  
Keyword(s):  
Curie Temperature ◽  
Ion Implantation ◽  
Diluted Magnetic Semiconductors ◽  
Laser Annealing ◽  
Magnetic Semiconductors ◽  
Dilute Magnetic Semiconductors ◽  
Pulsed Laser ◽  
Laser Melting ◽  
Co Doping ◽  
Diluted Magnetic

One of the most attractive characteristics of diluted ferromagnetic semiconductors is the possibility to modulate their electronic and ferromagnetic properties, coupled by itinerant holes through various means. A prominent example is the modification of Curie temperature and magnetic anisotropy by ion implantation and pulsed laser melting in III–V diluted magnetic semiconductors. In this study, to the best of our knowledge, we performed, for the first time, the co-doping of (In,Mn)As diluted magnetic semiconductors by Al by co-implantation subsequently combined with a pulsed laser annealing technique. Additionally, the structural and magnetic properties were systematically investigated by gradually raising the Al implantation fluence. Unexpectedly, under a well-preserved epitaxial structure, all samples presented weaken Curie temperature, magnetization, as well as uniaxial magnetic anisotropies when more aluminum was involved. Such a phenomenon is probably due to enhanced carrier localization introduced by Al or the suppression of substitutional Mn atoms.

Ferroelectric Hf 0.5 Zr 0.5 O 2 Thin Films Crystallized by Pulsed Laser Annealing

2021 ◽  
Author(s):  
Natalia Volodina ◽  
Anna Dmitriyeva ◽  
Anastasia Chouprik ◽  
Elena Gatskevich ◽  
Andrei Zenkevich
Keyword(s):  
Thin Films ◽  
Laser Annealing ◽  
Pulsed Laser ◽  
Pulsed Laser Annealing

scholarly journals Devitrification of thin film Cu-Zr metallic glass via ultrashort pulsed laser annealing

2021 ◽  
pp. 161437
Author(s):  
J. Antonowicz ◽  
P. Zalden ◽  
K. Sokolowski-Tinten ◽  
K. Georgarakis ◽  
R. Minikayev ◽  
...  
Keyword(s):  
Thin Film ◽  
Metallic Glass ◽  
Laser Annealing ◽  
Pulsed Laser ◽  
Pulsed Laser Annealing ◽  
Ultrashort Pulsed Laser

Dynamic behaviors of pulsed-laser annealing in ion-implanted silicon studied by measuring the optical reflectance

1979 ◽  
Author(s):  
Kouichi Murakami ◽  
Kenji Gamo ◽  
Susumu Namba ◽  
Mitsuo Kawabe ◽  
Yoshinobu Aoyagi ◽  
...  
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Optical Reflectance ◽  
Dynamic Behaviors ◽  
Pulsed Laser Annealing ◽  
Ion Implanted

Extended defect structure induced by pulsed laser annealing in Ge implanted Si crystal

2001 ◽  
Vol 328 (1-2) ◽  
pp. 242-247 ◽  
Author(s):  
D. Klinger ◽  
M. Lefeld-Sosnowska ◽  
J. Auleytner ◽  
D. Żymierska ◽  
L. Nowicki ◽  
...  
Keyword(s):  
Defect Structure ◽  
Laser Annealing ◽  
Pulsed Laser ◽  
Extended Defect ◽  
Pulsed Laser Annealing

Superconducting V3Si produced by pulsed laser annealing

1982 ◽  
Vol 41 (4) ◽  
pp. 321-324 ◽  
Author(s):  
B. Stritzker ◽  
B.R. Appleton ◽  
C.W. White ◽  
S.S. Lau
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Pulsed Laser Annealing

Pulsed Laser Annealing of R.F.Sputtered Amorphous Si : H.Films, Doped with Arsenic

1981 ◽  
Vol 4 ◽  
Author(s):  
E. Fogarassy ◽  
R. Stuck ◽  
M. Toulemonde ◽  
P. Siffert ◽  
J.F. Morhange ◽  
...  
Keyword(s):  
Ruby Laser ◽  
Laser Annealing ◽  
Pulsed Laser ◽  
Amorphous Layer ◽  
High Concentration ◽  
Topographic Analysis ◽  
Pulsed Laser Annealing ◽  
Residual Hydrogen ◽  
Silicon Target ◽  
Amorphous Si

Arsenic doped amorphous silicon layers have been deposited on silicon single crystals by R.F.cathodic sputtering of a silicon target in a reactive argon-hydrogen mixture, and annealed with a Q-switched Ruby laser. Topographic analysis of the irradiated layers has shown the formation of a crater, due to an evaporation effect of material which could be related to the presence of a high concentration of Ar in the amorphous layer. RBS and Raman Spectroscopy showed that the remaining layer is not recrystallised probably due to inhibition by the residual hydrogen. However, it was found that arsenic diffuses into the monocrystalline substrate by laser induced diffusion of dopant from the surface solid source, leading to the formation of good quality P-N junctions.

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