Брэгговские дефлекторы волновых потоков для мощных релятивистских мазеров

AbstractQuasi-optical Bragg structures that represent sections of planar waveguides with tilted (with respect to the beam propagation direction) corrugation are studied. It is shown that such structures may serve as efficient deflectors for high-power wave fluxes and, hence, can be used for separation of microwave radiation and electron beam in relativistic masers. The corrugation configuration is optimized to increase the efficiency of transformation of wave fluxes to the transverse direction and improve uniformity of the spatial distribution of scattered radiation. The simulated results are verified using cold electrodynamic tests.

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Correlation between High-Power Broadband Microwave Radiation and Strong Langmuir Turbulence in an Intense Relativistic Electron Beam-Plasma System

Journal of the Physical Society of Japan ◽

10.1143/jpsj.65.2081 ◽

1996 ◽

Vol 65 (7) ◽

pp. 2081-2086 ◽

Cited By ~ 6

Author(s):

Masayuki Yoshikawa ◽

Masaru Masuzaki ◽

Ritoku Ando ◽

Keiichi Kamada

Keyword(s):

Electron Beam ◽

Relativistic Electron ◽

Microwave Radiation ◽

High Power ◽

Relativistic Electron Beam ◽

Langmuir Turbulence ◽

Plasma System ◽

Beam Plasma ◽

Strong Langmuir Turbulence ◽

Electron Beam Plasma

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PIC Simulation of the High-Power Microwave Radiation in a Radial-Type Reflex Triode With a Converging Magnetized Electron Beam

IEEE Transactions on Plasma Science ◽

10.1109/tps.2020.3034935 ◽

2020 ◽

Vol 48 (12) ◽

pp. 4144-4148

Author(s):

Alexander E. Dubinov ◽

Vladimir P. Tarakanov

Keyword(s):

Electron Beam ◽

Microwave Radiation ◽

High Power ◽

Pic Simulation ◽

High Power Microwave ◽

Power Microwave

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Development of the Two-Stage Planar Fem for the Terahertz Band on the Basis of the ELMI Accelerator

Siberian Journal of Physics ◽

10.54362/1818-7919-2012-7-1-5-14 ◽

2012 ◽

Vol 7 (1) ◽

pp. 5-14

Author(s):

Andrey Arzhannikov ◽

Naum Ginzburg ◽

Vladislav Zaslavkiy ◽

Irina Zotova ◽

Petr Kalinin ◽

...

Keyword(s):

High Power ◽

High Frequency ◽

Scattered Radiation ◽

Electron Beams ◽

Low Frequency ◽

Stimulated Scattering ◽

Two Stage ◽

Terahertz Band ◽

Bragg Structures ◽

Cathode Unit

Project of the two-stage FEM-generator based on the ELMI accelerator with two parallel sheet electron beams formed in a single cathode unit is under development currently. In this scheme the first beam is used in the low-frequency section of the FEM for generating of high-power 75 GHz radiation. This radiation than goes through the coupling waveguides to the second channel and operates as a pumping wave which scatter on the second beam into the terahertz band. Our paper is devoted to modeling of various stimulated scattering regimes in this high-frequency section. Regime of the selfamplified spontaneous emission (SASE) is considered as well as a generator with resonator for the scattered radiation formed with advanced Bragg structures, based on coupling of traveling and quasi-critical waves

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Преобразование частоты излучения мощных гиротронов в условиях обратного рамановского рассеяния на дополнительном электронном пучке

Письма в журнал технической физики ◽

10.21883/pjtf.2019.04.47329.17593 ◽

2019 ◽

Vol 45 (4) ◽

pp. 13

Author(s):

Н.С. Гинзбург ◽

Л.А. Юровский ◽

И.В. Зотова ◽

А.С. Сергеев

Keyword(s):

Electron Beam ◽

Electron Energy ◽

High Power ◽

Scattered Radiation ◽

Frequency Conversion ◽

Scattered Signal ◽

Absolute Instability ◽

Radiation Frequency ◽

The Absolute

AbstractThe regime of Raman backscattering of a pumping wave that is cocurrent with an electron beam into the counterpropagating wave can be used for the radiation frequency conversion in high-power gyrotrons. The absolute instability developing in this system ensures generation of a scattered signal in the absence of external resonators, which allows the frequency of scattered radiation to be smoothly controlled within 20–40% by varying the electron energy in the case of high-power (megawatt) gyrotrons used as sources of pumping radiation.

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Lithography below 100 nm

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100074367 ◽

1983 ◽

Vol 41 ◽

pp. 96-99

Author(s):

L. D. Jackel

Keyword(s):

Spatial Distribution ◽

Electron Beam ◽

Electron Scattering ◽

Electron Beam Lithography ◽

Substrate Material ◽

Local Electron ◽

Electron Dose ◽

Positive Resist ◽

Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

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