scholarly journals Синтез высокоориентированных пленок оксида цинка на аморфных подложках методом магнетронного распыления на постоянном токе

2018 ◽  
Vol 44 (12) ◽  
pp. 52
Author(s):  
А.М. Исмаилов ◽  
Л.Л. Эмирасланова ◽  
М.Х. Рабаданов ◽  
М.Р. Рабаданов ◽  
И.Ш. Алиев
Keyword(s):  
Discharge Plasma ◽  
Structural Characteristics ◽  
High Growth ◽  
Zno Films ◽  
Technological Parameters ◽  
Magnetron Discharge ◽  
Direct Current Magnetron Sputtering ◽  
Amorphous Substrates ◽  
Crystallite Shape ◽  
Substrate Position

AbstractWe describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of direct-current magnetron sputtering. It is suggested to optimize the substrate position with respect to magnetron and consider the floating potential to which the substrate is charged in magnetron discharge plasma as one of the main technological parameters. Electrondiffraction study of the structural characteristics of the obtained ZnO films showed that increase in the substrate temperature was accompanied by transformation of the crystallite shape from platelike to columnar.

Principal Physics of Oblique Sputtering of Calcium Phosphate Coatings Using RF-Magnetron Discharge Plasma

2021 ◽  
Vol 63 (11) ◽  
pp. 1891-1897
Author(s):  
K. A. Prosolov ◽  
O. A. Belyavskaya ◽  
V. V. Lastovka ◽  
M. V. Chaikina ◽  
Yu. P. Sharkeev
Keyword(s):  
Calcium Phosphate ◽  
Discharge Plasma ◽  
Magnetron Discharge ◽  
Phosphate Coatings ◽  
Calcium Phosphate Coatings

scholarly journals Optical and Electrical Properties of (002)-Oriented ZnO Films Prepared on Amorphous Substrates by Sol-Gel Spin-Coating

2016 ◽  
Vol 19 (suppl 1) ◽  
pp. 113-117 ◽  
Author(s):  
Gonzalo Alonso Velázquez-Nevárez ◽  
Jorge Roberto Vargas-García ◽  
Jorge Aguilar-Hernández ◽  
Oscar Edgardo Vega-Becerra ◽  
Fei Chen ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Spin Coating ◽  
Sol Gel ◽  
Zno Films ◽  
Optical And Electrical Properties ◽  
Amorphous Substrates

scholarly journals Sprayed Pyrolyzed ZnO Films with Nanoflake and Nanorod Morphologies and Their Photocatalytic Activity

2016 ◽  
Vol 2016 ◽  
pp. 1-11 ◽  
Author(s):  
Nora S. Portillo-Vélez ◽  
Monserrat Bizarro
Keyword(s):  
Photocatalytic Activity ◽  
Large Scale ◽  
Spray Pyrolysis Technique ◽  
Structural Characteristics ◽  
Zno Nanorods ◽  
Volume Ratio ◽  
Precursor Solution ◽  
Synthesis Process ◽  
Zno Films ◽  
Scale Production

There is an increasing interest on the application of ZnO nanorods in photocatalysis and many growth methods have been applied, in particular the spray pyrolysis technique which is attractive for large scale production. However it is interesting to know if the nanorod morphology is the best considering its photocatalytic activity, stability, and cost effectiveness compared to a nonoriented growth. In this work we present a systematic study of the effect of the precursor solution (type of salt, solvent, and concentration) on the morphology of sprayed ZnO films to obtain nanoflakes and nanorods without the use of surfactants or catalysts. The surface properties and structural characteristics of these types of films were investigated to elucidate which morphology is more favorable for photocatalytic applications. Wettability and photocatalytic experiments were carried out in the same conditions. After UV irradiation both morphologies became hydrophilic and achieved a dye discoloration efficiency higher than 90%; however, the nanoflake morphology provided the highest photocatalytic performance (99% dye discoloration) and stability and the lowest energy consumption during the synthesis process. The surface-to-volume ratio revealed that the nanoflake morphology is more adequate for photocatalytic water treatment applications and that the thin nanorods should be preferred over the large ones.

New Method for Synthesis of Hard Coatings Using Pulsed Bombardment with High-Energy Gas Atoms

2016 ◽  
Vol 876 ◽  
pp. 14-24
Author(s):  
Abdumalik Rakhimovich Seitkulov ◽  
Sergey Nikolaevich Grigoriev ◽  
Alexander Sergeevich Metel ◽  
Marina Aleksandrovna Volosova ◽  
Yury Andreevich Melnik
Keyword(s):  
Surface Layer ◽  
Space Charge ◽  
Charge Exchange ◽  
High Voltage ◽  
Discharge Plasma ◽  
High Energy ◽  
Hard Coatings ◽  
Magnetron Discharge ◽  
Metal Atoms ◽  
Pass Through

For deposition of hard coatings is used a source of metal atoms accompanied by high-energy gas atoms. The metal atoms are produced due to sputtering a flat rectangular target in low pressure magnetron discharge. The gas atoms with energy up to 30 keV are produced due to charge exchange collisions of accelerated ions in space charge sheaths near the surfaces of a grid parallel to the target. The ions are extracted from the discharge plasma and accelerated by high-voltage pulses applied to the grid. The metal atoms pass through the grid and deposit on the products. Conjunction of their trajectories with those of gas atoms bombarding the growing coating allows synthesis of the coatings on rotating dielectric products. Mixing by high-energy gas atoms of the coating atoms and atoms of the product material in its surface layer improves the coating adhesion.

scholarly journals AUTOMATED SPECTROMETRIC COMPLEX FOR DIAGNOSTICS OF MAGNETRON DISCHARGE PLASMA

2009 ◽  
Vol 32 (1) ◽  
pp. 64-71
Author(s):  
V.M. Gradov ◽  
◽  
A.M. Zimin ◽  
S.E. Krivitsky ◽  
A.V. Shumov ◽  
...  
Keyword(s):  
Discharge Plasma ◽  
Magnetron Discharge

LOW-TEMPERATURE CVD GROWTH OF ZnO FILMS STIMULATED BY RF-DISCHARGE PLASMA

2004 ◽  
Author(s):  
B. M. ATAEV ◽  
A. M. BAGAMADOVA ◽  
I. K. KAMILOV ◽  
V. V. MAMEDOV ◽  
A. K. OMAEV ◽  
...  
Keyword(s):  
Low Temperature ◽  
Discharge Plasma ◽  
Rf Discharge ◽  
Zno Films ◽  
Cvd Growth
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