Determination of the absolute hardness of electrolytically produced copper coatings by application of the Chicot-Lesage composite hardness model

In this study, a novel procedure based on application of the Chicot?Lesage (C?L) composite hardness model was proposed for determination of an absolute hardness of electrolytically produced copper coatings. The Cu coatings were electrodeposited on the Si(111) substrate by the pulsating current (PC) regime with a variation of the following parameters: the pause duration, the current density amplitude and the coating thickness. The topography of produced coatings was characterized by atomic force microscope (AFM), while a hardness of the coatings was examined by Vickers microindentation test. Applying the C?L model, the critical relative indentation depth (RID)c of 0.14 was determined, which is independent of all examined parameters of the PC regime. This RID value separated the area in which the composite hardness of the Cu coating corresponded to its absolute hardness (RID < 0.14) from the area in which application of the C?L model was necessary for a determination of the absolute coating hardness (RID ? 0.14). The obtained value was in a good agreement with the value already published in the literature.

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Implementation of the Chicot–Lesage Composite Hardness Model in a Determination of Absolute Hardness of Copper Coatings Obtained by the Electrodeposition Processes

Metals ◽

10.3390/met11111807 ◽

2021 ◽

Vol 11 (11) ◽

pp. 1807

Author(s):

Ivana O. Mladenović ◽

Jelena S. Lamovec ◽

Dana G. Vasiljević-Radović ◽

Rastko Vasilić ◽

Vesna J. Radojević ◽

...

Keyword(s):

Preferred Orientation ◽

Sulfate Electrolyte ◽

X Ray Diffraction ◽

Fine Grained ◽

Atomic Force ◽

Copper Coatings ◽

Hardness Model ◽

Composite Hardness ◽

Coating Hardness

The influence of various electrolysis parameters, such as the type of cathode, composition of the electrolyte and electrolysis time, on the morphology, structure and hardness of copper coatings has been investigated. Morphology and structure of the coatings were analyzed by scanning electron microscope (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD), while coating hardness was examined by Vickers microindentation test applying the Chicot–Lesage (C–L) composite hardness model. Depending on the conditions of electrolysis, two types of Cu coatings were obtained: fine-grained mat coatings with a strong (220) preferred orientation from the sulfate electrolyte and smooth mirror bright coatings with a strong (200) preferred orientation from the electrolyte with added leveling/brightening additives. The mat coatings showed larger both measured composite and calculated coating hardness than the mirror bright coatings, that can be explained by the phenomena on boundary among grains. Independent of electrolysis conditions, the critical relative indentation depth (RID) of 0.14 was established for all types of the Cu coatings, separating the zone in which the composite hardness can be equaled with the coating hardness and the zone requiring an application of the C–L model for a determination of the absolute hardness of the Cu coatings.

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Application of the Composite Hardness Models in the Analysis of Mechanical Characteristics of Electrolytically Deposited Copper Coatings: The Effect of the Type of Substrate

Metals ◽

10.3390/met11010111 ◽

2021 ◽

Vol 11 (1) ◽

pp. 111

Author(s):

Ivana O. Mladenović ◽

Nebojša D. Nikolić ◽

Jelena S. Lamovec ◽

Dana Vasiljević-Radović ◽

Vesna Radojević

Keyword(s):

Mechanical Characteristics ◽

Dislocation Creep ◽

Average Current Density ◽

Fine Grained ◽

Copper Coatings ◽

Electrochemically Deposited ◽

Composite Models ◽

Average Current ◽

Composite Hardness ◽

Coating Hardness

The mechanical characteristics of electrochemically deposited copper coatings have been examined by application of two hardness composite models: the Chicot-Lesage (C-L) and the Cheng-Gao (C-G) models. The 10, 20, 40 and 60 µm thick fine-grained Cu coatings were electrodeposited on the brass by the regime of pulsating current (PC) at an average current density of 50 mA cm−2, and were characterized by scanning electron (SEM), atomic force (AFM) and optical (OM) microscopes. By application of the C-L model we determined a limiting relative indentation depth (RID) value that separates the area of the coating hardness from that with a strong effect of the substrate on the measured composite hardness. The coating hardness values in the 0.9418–1.1399 GPa range, obtained by the C-G model, confirmed the assumption that the Cu coatings on the brass belongs to the “soft film on hard substrate” composite hardness system. The obtained stress exponents in the 4.35–7.69 range at an applied load of 0.49 N indicated that the dominant creep mechanism is the dislocation creep and the dislocation climb. The obtained mechanical characteristics were compared with those recently obtained on the Si(111) substrate, and the effects of substrate characteristics such as hardness and roughness on the mechanical characteristics of the electrodeposited Cu coatings were discussed and explained.

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Micromechanical Characterization of Complex Polypropylene Morphologies by HarmoniX AFM

International Journal of Polymer Science ◽

10.1155/2017/9037127 ◽

2017 ◽

Vol 2017 ◽

pp. 1-12 ◽

Cited By ~ 5

Author(s):

S. Liparoti ◽

A. Sorrentino ◽

V. Speranza

Keyword(s):

Elastic Moduli ◽

Force Microscopy ◽

Atomic Force ◽

Indentation Tests ◽

Injection Molded ◽

Micromechanical Characterization ◽

Complex Polymer ◽

Good Agreement

This paper examines the capability of the HarmoniX Atomic Force Microscopy (AFM) technique to draw accurate and reliable micromechanical characterization of complex polymer morphologies generally found in conventional thermoplastic polymers. To that purpose, injection molded polypropylene samples, containing representative morphologies, have been characterized by HarmoniX AFM. Mapping and distributions of mechanical properties of the samples surface are determined and analyzed. Effects of sample preparation and test conditions are also analyzed. Finally, the AFM determination of surface elastic moduli has been compared with that obtained by indentation tests, finding good agreement among the results.

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Intercomparison of erythemal broadband radiometers calibrated by seven UV calibration facilities in Europe and the USA

Atmospheric Chemistry and Physics Discussions ◽

10.5194/acpd-8-2249-2008 ◽

2008 ◽

Vol 8 (1) ◽

pp. 2249-2273

Author(s):

G. Hülsen ◽

J. Gröbner ◽

A. Bais ◽

M. Blumthaler ◽

P. Disterhoft ◽

...

Keyword(s):

Absolute Calibration ◽

Angular Response ◽

The Usa ◽

Combined Uncertainty ◽

The Absolute ◽

Spectral Responses ◽

Good Agreement

Abstract. A bi-lateral intercomparison of erythemal broadband radiometers was performed between seven UV calibration facilities. The owners calibrations were compared relative to the characterisation and calibration performed at PMOD/WRC in Davos, Switzerland. The calibration consisted in the determination of the spectral and angular response of the radiometer, followed by an absolute calibration performed outdoors relative to a spectroradiometer which provided the absolute reference. The characterization of the detectors in the respective laboratories are in good agreement: The determination of the angular responses have deviations below ±4% and the spectral responses agree within ±20%. A "blind" intercomparison of the erythemally weighted irradiances derived by the respective institutes and PMOD/WRC showed consistent measurements to within ±2% for the majority of institutes. One institute showed slightly larger deviation of 10%. The differences found between the different instrument calibrations are all within the combined uncertainty of the calibration.

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Intercomparison of erythemal broadband radiometers calibrated by seven UV calibration facilities in Europe and the USA

Atmospheric Chemistry and Physics ◽

10.5194/acp-8-4865-2008 ◽

2008 ◽

Vol 8 (16) ◽

pp. 4865-4875 ◽

Cited By ~ 11

Author(s):

G. Hülsen ◽

J. Gröbner ◽

A. Bais ◽

M. Blumthaler ◽

P. Disterhoft ◽

...

Keyword(s):

Absolute Calibration ◽

Angular Response ◽

The Usa ◽

Combined Uncertainty ◽

The Absolute ◽

Spectral Responses ◽

Good Agreement

Abstract. A bi-lateral intercomparison of erythemal broadband radiometers was performed between seven UV calibration facilities. The calibrations provided by the instruments owners were compared relative to the characterisation and calibration performed at PMOD/WRC in Davos, Switzerland. The calibration consisted in the determination of the spectral and angular response of the radiometer, followed by an absolute calibration performed outdoors relative to a spectroradiometer which provided the absolute reference. The characterization of the detectors in the respective laboratories are in good agreement: The determinations of the angular responses have deviations below ±4% and the spectral responses agree within ±20%. A "blind" intercomparison of the erythemally weighted irradiances derived by the respective institutes and PMOD/WRC showed consistent measurements to within ±2% for the majority of institutes. One institute showed slightly larger deviation of 10%. The differences found between the different instrument calibrations are all within the combined uncertainty of the calibration.

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Mirror effect in atomic force microscopy profiles enables tip reconstruction

Scientific Reports ◽

10.1038/s41598-020-75785-0 ◽

2020 ◽

Vol 10 (1) ◽

Author(s):

Francisco Marques-Moros ◽

Alicia Forment-Aliaga ◽

Elena Pinilla-Cienfuegos ◽

Josep Canet-Ferrer

Keyword(s):

Atomic Force Microscopy ◽

Reconstruction Process ◽

Calibration Standards ◽

Force Microscopy ◽

Atomic Force ◽

Real Distribution ◽

Tip Radius ◽

Convolution Effect ◽

Good Agreement

Abstract In this work, the tip convolution effect in atomic force microscopy is revisited to illustrate the capabilities of cubic objects for determination of the tip shape and size. Using molecular-based cubic nanoparticles as a reference, a two-step tip reconstruction process has been developed. First, the tip-to-face angle is estimated by means of an analysis of the convolution error while the tip radius is extracted from the experimental profiles. The results obtained are in good agreement with specification of the tip supplier even though the experiments have been conducted using real distribution of nanoparticles with dispersion in size and aspect ratio. This demonstrates the reliability of our method and opens the door for a more accurate tip reconstruction by using calibration standards.

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Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111)

Metals ◽

10.3390/met10040488 ◽

2020 ◽

Vol 10 (4) ◽

pp. 488 ◽

Cited By ~ 1

Author(s):

Ivana O. Mladenović ◽

Jelena S. Lamovec ◽

Dana G. Vasiljević Radović ◽

Rastko Vasilić ◽

Vesna J. Radojević ◽

...

Keyword(s):

Current Density ◽

Diffusion Control ◽

Copper Electrodeposition ◽

Average Current Density ◽

Fine Grained ◽

Average Current ◽

Hardness Model ◽

Xrd Techniques ◽

Composite Hardness ◽

Pulsating Current

Copper electrodeposition on (111)-oriented Si substrate was performed by the pulsating current (PC) regime at various average current densities in the range of 15–70 mA·cm−2, obtained by varying either the frequency (30, 50, 80 and 100 Hz for the current density amplitude of 100 mA·cm−2) or the current density amplitude (120 and 140 mA·cm−2 at 100 Hz). The produced Cu coatings were examined by SEM, AFM and XRD techniques. The morphology of the coatings changed from those with large grains to fine-grained and globular, while the crystal structure changed from the strong (220) to the strong (111) preferred orientation by increasing the average current density. The mechanical characteristics of coatings were examined using Vickers micro-indentation tests, applying the Chicot–Lesage (C–L) composite hardness model for the analysis of microhardness. The maximum microhardness was obtained for the Cu coating produced at an average current density of 50 mA·cm−2, with a current density amplitude of 100 mA·cm−2 and a frequency of 100 Hz. This copper coating was fine-grained and showed the smallest roughness in relation to the other coatings, and it was obtained in the mixed activation–diffusion control between the end of the effect of the activation control and the beginning of the dominant effect of diffusion control.

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Determination of Absolute Proper Motions by Use of Automated Measurements of Tautenburg Plates

Symposium - International Astronomical Union ◽

10.1017/s007418090008726x ◽

1990 ◽

Vol 141 ◽

pp. 451-452

Author(s):

R.-D. Scholz

Keyword(s):

Globular Cluster ◽

Proper Motion ◽

Proper Motions ◽

Automated Measurements ◽

The Absolute ◽

Good Agreement

From measurements of Tautenburg Schmidt plates with the APM in Cambridge positional accuracies per plate of 0.″05 for stars and of 0.″10 for galaxies were achieved. With 0.″3/100a accuracy in a single stellar proper motion we obtained the absolute proper motion of the M3 globular cluster in good agreement between the two pairs of plates used.

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Remarks on the Efficiencies of Geiger, Proportional, and Cintillation Counters with Application to the Absolute Intensity of Characteristic X-Radiation

Australian Journal of Physics ◽

10.1071/ph640200 ◽

1964 ◽

Vol 17 (2) ◽

pp. 200

Author(s):

V Metchnik

Keyword(s):

Scintillation Counter ◽

Absolute Intensity ◽

Geiger Counter ◽

Counting Efficiency ◽

Side Window ◽

Intensity Measurements ◽

Quantum Counting ◽

The Absolute ◽

Good Agreement

The measurements of the absolute intensities of Ou Ka radiation, isolated by means of balanced nickel and iron filters,. necessitated the determination of the quantum counting efficiency of three types of detectors: an end� window argon-filled Geiger counter, a two side-window, xenon-filled proportional counter, and a scintillation counter with NaITI crystal. It is shown that, provided the necessary corrections are made, results of absolute intensity measurements obtained with these three detectors show good agreement.

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Measurement of absolute light yield and quantum efficiency of LaBr3:Ce scintillator detector using SiPM

Journal of Instrumentation ◽

10.1088/1748-0221/16/12/p12024 ◽

2021 ◽

Vol 16 (12) ◽

pp. P12024

Author(s):

R. Sariyal ◽

I. Mazumdar ◽

S.M. Patel

Keyword(s):

Quantum Efficiency ◽

Measurement Method ◽

Light Yield ◽

Comparison Method ◽

Scintillation Detectors ◽

Photo Detectors ◽

The Absolute ◽

Scintillator Detector ◽

Good Agreement

Abstract This brief communication presents our work to determine the absolute light yield and quantum efficiency of LaBr3:Ce scintillator by comparison and also by direct pulse measurement method using SiPM. The first part presents use of the simpler comparison method to determine the light yields of different scintillators using the known yield of NaI(Tl) as reference. In the second part we have determined the absolute light yield and quantum efficiency of LaBr3:Ce crystal by using a SiPM photo detector. Our measured value is in good agreement with the light yield reported by previous measurements using PMT and excitation fluorescence spectroscopy. Quantum efficiencies for scintillation detectors have been determined by using both PMTs and photo detectors, namely APDs by previous authors. This communication is possibly the first report on the determination of quantum efficiency of LaBr3:Ce using SiPM photo detector. The simple and effective method presented here would allow to determine the light yield of any scintillation detector.

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