Evaluation of Power SiC-MOSFET Using Super-Higher-Order Scanning Nonlinear Dielectric Microscopy—Imaging of Carrier Distribution and Depletion Layer
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Low Cost
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Abstract Evaluation techniques for semiconductor devices are keys for device development with low cost and short time to market. Especially, dopant and depletion layer distribution in devices is a critical electrical property that needs to be evaluated. Super-higher-order nonlinear dielectric microscopy (SHOSNDM) is one of the promising techniques for semiconductor device evaluation. We developed a method for imaging detailed dopant distribution and depletion layers in semiconductor devices using SHO-SNDM. As a demonstration, a cross-section of a SiC power semiconductor device was measured by this method and detailed dopant distribution and depletion layer distributions were imaged.
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1998 ◽
Vol 118
(5)
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pp. 266-269
2020 ◽
Vol 8
(6)
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pp. 754-757
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2010 ◽
Vol 130
(6)
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pp. 911-911
2014 ◽
Vol 134
(6)
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pp. 432-433