scholarly journals Revealing Spider Silk's 3D Nanostructure Through Low Temperature Plasma Etching and Advanced Low-Voltage SEM

2019 ◽  
Vol 5 ◽  
Author(s):  
Nicola Stehling ◽  
Kerry J. Abrams ◽  
Chris Holland ◽  
Cornelia Rodenburg
Keyword(s):  
Low Temperature ◽  
Plasma Etching ◽  
Low Voltage ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
3D Nanostructure

Low Temperature Plasma Etching of Copper for Minimizing Size Effects in sub-100 nm Features

2006 ◽  
Vol 914 ◽  
Author(s):  
Nagraj S Kulkarni ◽  
Prabhakar Tamirisa ◽  
Galit Levitin ◽  
Richard J Kasica ◽  
Dennis W Hess
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Plasma Etching ◽  
Size Effects ◽  
Copper Interconnects ◽  
Etching Process ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Potential Benefits ◽  
Key Features

AbstractA low temperature plasma etching process for patterning copper interconnects is proposed as a solution to the size effect issue in the resistivity of copper. Key features of this etching process based on a previous thermochemical analysis of the Cu-Cl-H system are discussed. Potential benefits of a subtractive etching scheme based on this process in comparison with the damascene scheme for copper-based interconnect processing in sub-100 nm features are presented in the context of the ITRS roadmap. Preliminary experimental work on plasma etching of Cu thin films using the proposed process is discussed.

scholarly journals The Transformation of Di- and Tri-chloromethane Induced By Low Voltage Discharge

2020 ◽  
Author(s):  
Bodrikov Ivan Vasilievich ◽  
Grinvald Iosif Isaevich ◽  
Titov Evgeniy Yuryevich ◽  
Titov Evgeniy Yuryevich ◽  
Razov Evgeniy Nikolaevich
Keyword(s):  
Electron Microscopy ◽  
Liquid Phase ◽  
Low Temperature ◽  
Gas Phase ◽  
Low Voltage ◽  
Current Source ◽  
Low Temperature Plasma ◽  
Plasma Discharges ◽  
Temperature Plasma ◽  
Molecular Systems

This article is focused on the transformation of di- and trichloromethane by induced low-voltage discharges in the liquid phase. To generate discharges, a direct current source is used (capacitance 2200 μF, voltage 60 V). The products and probable intermediates of the CH2Cl2 and CHCl3 transformation were determined by the methods of thermodynamic modeling, FTIR spectroscopy and electron microscopy. Under the action of low-voltage discharges on the liquid substrates, needle fullerene- like structures are formed. In this case the gas phase consists mainly of hydrogen chloride. From the simulation of the nonequilibrium composition of particles and molecular systems it follows that in the course of induced reactions of CH2Cl2 and CHCl3 and geminal elimination of HCl molecules, predominantly carbene-type intermediates are generated. Keywords: dichloromethane, trichloromethane, low temperature plasma, discharges in the liquid phase

scholarly journals Low temperature plasma etching for Si3N4 waveguide applications

2008 ◽  
Vol 26 (2) ◽  
pp. 253-258 ◽  
Author(s):  
D. Celo ◽  
R. Vandusen ◽  
T. Smy ◽  
J. Albert ◽  
N. G. Tarr ◽  
...  
Keyword(s):  
Low Temperature ◽  
Plasma Etching ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-temperature plasma etching of GaAs, AlGaAs, and AlAs

1993 ◽  
Vol 13 (3) ◽  
pp. 521-537 ◽  
Author(s):  
Jeffrey A. Gregus ◽  
Matthew F. Vernon ◽  
Richard A. Gottscho ◽  
Geoffrey R. Scheller ◽  
William S. Hobson ◽  
...  
Keyword(s):  
Low Temperature ◽  
Plasma Etching ◽  
Low Temperature Plasma ◽  
Temperature Plasma
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