Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering
2018 ◽
Vol 5
(7)
◽
pp. 15228-15232
◽
Keyword(s):
Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering
2011 ◽
Vol 26
(12)
◽
pp. 1287-1292
◽
2011 ◽
Vol 406
(13)
◽
pp. 2658-2662
◽
2012 ◽
Vol 51
(2)
◽
pp. 02BM04
◽
Keyword(s):
2010 ◽
Vol 45
(18)
◽
pp. 4994-5001
◽